Inventor
Tatsuya Fujimoto
Inventor
Tokyo, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
A61CDentistry13%
A61KPreparations for medical, dental or toiletry purposes9%
A61QSpecific use of cosmetics or similar toiletry preparations9%
C03CChemical composition of glasses, glazes or vitreous enamels9%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients9%
B29CShaping or joining of plastics4%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts4%
B29LIndexing scheme associated with subclass b29c, relating to particular articles4%
C04BLime, magnesia4%
PatentTitleYear
10,405,953Method for producing dental prosthesis, method for producing lithium disilicate blank for dental prosthesis and lithium disilicate blank for dental prosthesis201910,182,894Method for manufacturing dental prosthesis20199,700,392'Method for producing dental prosthesis, method for producing lithium disilicate blank for dental prosthesis and lithium disilicate blank for dental prosthesis'20177,847,012'Vinyl chloride resin composition and molded article thereof'20107,514,495'Antistatic agent for vinyl chloride-based resins, vinyl chloride-based resin composition containing the same, and method for manufacturing this composition'20096,326,454'Composition comprising condensation product of dimer of 2,3-dihydroxynaphthalene and formaldehyde for polymerization'20016,288,258'Preparation of organohalosilanes'20016,121,390'Process of producing vinyl chloride polymer by using condensation product of dimer of 2,3-dihydroxynaphthalene and formaldehyde'20005,294,684'Process for producing vinyl chloride resin'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2010Patents assigned to SHINETSU CHEMICAL CO (6)· patent assignee history
1994–2010Based in Kamisu, JP· patent location history
2000–2001Based in Suwa, JP· patent location history
2001Based in Kashima, JP· patent location history
2017–2019Patents assigned to G C DENTAL IND CORP (3)· patent assignee history
2017–2019Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 6 | 1994–2010 |
| G C DENTAL IND CORP | 3 | 2017–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 3 | 2017–2019 |
| Kamisu, JP | 3 | 1994–2010 |
| Suwa, JP | 2 | 2000–2001 |
| Kashima, JP | 1 | 2001 |