Inventor
Paul Janis Timans
Inventor
Mountain View, CA, US
Overview
Patents· 43 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%
C30BSingle-crystal growth13%
F27BFurnaces, kilns, ovens or retorts in general13%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light9%
C23CCoating metallic material7%
H01LSemiconductor devices5%
G02BOptical elements, systems or apparatus5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
G01KMeasuring temperature4%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace2%
PatentTitleYear
11,101,142Pre-heat processes for millisecond anneal system202110,679,864Pre-heat processes for millisecond anneal system202010,262,873Pre-heat processes for millisecond anneal system201910,190,915System and process for calibrating pyrometers in thermal processing chambers20199,633,876'Selective reflectivity process chamber with customized wavelength response and method'20178,918,303'System and process for calibrating pyrometers in thermal processing chambers'20148,837,923'Pulsed processing semiconductor heating methods using combinations of heating sources'20148,696,197'Method and system for determining optical properties of semiconductor wafers'20148,668,383'Methods for determining wafer temperature'20148,669,496'System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy'20148,575,521'Monitoring witness structures for temperature control in RTP systems'20138,557,721'Rapid thermal processing using energy transfer layers'20138,296,091'System and process for calibrating pyrometers in thermal processing chambers'20128,236,706'Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures'20128,222,570'System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy'20128,157,439'Methods for determining wafer temperature'20128,152,365'Method and system for determining optical properties of semiconductor wafers'20128,138,105'Rapid thermal processing using energy transfer layers'20128,000,587'Pulsed processing semiconductor heating methods and associated system using combinations of heating sources'20117,977,258'Method and system for thermally processing a plurality of wafer-shaped objects'20117,976,216'Determining the temperature of silicon at high temperatures'20117,957,926'System and process for calibrating pyrometers in thermal processing chambers'20117,949,237'Heating configuration for use in thermal processing chambers'20117,847,218'System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy'20107,745,762'Optimizing the thermal budget during a pulsed heating process'20107,737,385'Selective reflectivity process chamber with customized wavelength response and method'20107,734,439'System and process for calibrating pyrometers in thermal processing chambers'20107,642,205'Rapid thermal processing using energy transfer layers'20107,543,981'Methods for determining wafer temperature'20097,453,051'System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy'20087,358,462'Apparatus and method for reducing stray light in substrate processing chambers'20087,317,870'Pulsed processing semiconductor heating methods using combinations of heating sources'20087,269,343'Heating configuration for use in thermal processing chambers'20077,135,656'Apparatus and method for reducing stray light in substrate processing chambers'20067,115,837'Selective reflectivity process chamber with customized wavelength response and method'20067,045,746'Shadow-free shutter arrangement and method'20067,015,422'System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy'20066,970,644'Heating configuration for use in thermal processing chambers'20056,951,996'Pulsed processing semiconductor heating methods using combinations of heating sources'20056,849,831'Pulsed processing semiconductor heating methods using combinations of heating sources'20056,835,914'Apparatus and method for reducing stray light in substrate processing chambers'20046,717,158'Heating device for heating semiconductor wafers in thermal processing chambers'20046,222,990'Heating element for heating the edges of wafers in thermal processing chambers'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2019Based in Mountain View, CA, US· patent location history
2004–2021Patents assigned to MATTSON TECH INC (42)· patent assignee history
2012–2014Patents assigned to TIMANS PAUL JANIS (9)· patent assignee history
2012–2017Patents assigned to TIMANS PAUL J (4)· patent assignee history
2012–2013Patents assigned to NENYEI ZSOLT (2)· patent assignee history
2019–2021Based in Cambridge, GB· patent location history
2020–2021Patents assigned to BEIJING E TOWN SEMICONDUCTOR TECH CO LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MATTSON TECH INC | 42 | 2004–2021 |
| TIMANS PAUL JANISself | 9 | 2012–2014 |
| TIMANS PAUL Jself | 4 | 2012–2017 |
| BEIJING E TOWN SEMICONDUCTOR TECH CO LTD | 2 | 2020–2021 |
| NENYEI ZSOLT | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mountain View, California, US | 40 | 2001–2019 |
| Cambridge, GB | 3 | 2019–2021 |