Inventor
Tokio Nishita
Inventor
Toyama, JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Dprimary
C09DCoating compositions, e.g. paints, varnishes or lacquers20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds15%
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%
C08LCompositions of macromolecular compounds4%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
C07CAcyclic or carbocyclic compounds2%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%
PatentTitleYear
11,130,855Composition for forming release layer, and release layer202111,009,795Aqueous solution for resist pattern coating and pattern forming methods using the same202110,795,261Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same202010,613,435Coating solution for resist pattern coating and method for forming pattern202010,295,907Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure201910,242,871Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group201910,133,178Coating liquid for resist pattern coating201810,113,083Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound20189,910,354'Resist underlayer film-forming composition and method for forming resist pattern using the same'20189,448,480'Resist underlayer film formation composition and method for forming resist pattern using the same'20169,394,231'Composition for forming antistatic film and oligomer compound'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2020Patents assigned to NISSAN CHEMICAL IND LTD (9)· patent assignee history
2016–2021Based in Toyama, JP· patent location history
2021Patents assigned to NISSAN CHEMICAL CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL IND LTD | 9 | 2016–2020 |
| NISSAN CHEMICAL CORP | 2 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 11 | 2016–2021 |