Inventor
Michael J. McFarland
Inventor
Washington, NJ, US
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
G02BOptical elements, systems or apparatus16%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein9%
C07DHeterocyclic compounds7%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
C07CAcyclic or carbocyclic compounds4%
F21VFunctional features or details of lighting devices or systems thereof4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
Y10TTechnical subjects covered by former us classification4%
PatentTitleYear
10,549,704Cold formed glass applique20206,728,445'Closed-loop control of tunable optical wavelength filters'20046,550,942'Linear illumination sources and systems'20036,186,649'Linear illumination sources and systems'20016,114,090'Thermally-stable photopolymer composition and light transmissive device'20005,541,039'Method for forming optically active waveguides'19965,521,726'Polarizer with an array of tapered waveguides'19965,481,385'Direct view display device with array of tapered waveguide on viewer side'19965,462,700'Process for making an array of tapered photopolymerized waveguides'19955,359,687'Polymer microstructures which facilitate fiber optic to waveguide coupling'19945,225,244'Polymeric anti-reflection coatings and coated articles'19935,200,529'Blocked monomer and polymers therefrom for use as photoresists'19935,186,865'Electro-optical materials and light modulator devices containing same'19935,178,955'Polymeric anti-reflection coatings and coated articles'19935,081,001'Blocked monomer and polymers therefrom for use as photoresists'19925,061,404'Electro-optical materials and light modulator devices containing same'19915,059,513'Photochemical image process of positive photoresist element with maleimide copolymer'19915,019,488'Method of producing an image reversal negative photoresist having a photo-labile blocked imide'19914,968,581'High resolution photoresist of imide containing polymers'19904,962,171'Blocked monomer and polymers therefrom for use as photoresists'19904,912,018'High resolution photoresist based on imide containing polymers'19904,902,784'1,3 Disubstituted-5-diazobarbituric acids'19904,857,435'Positive photoresist thermally stable compositions and elements having deep UV response with maleimide copolymer'19894,837,124'High resolution photoresist of imide containing polymers'19894,810,613'Blocked monomer and polymers therefrom for use as photoresists'19894,775,609'Image reversal'19884,735,885'Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids'19884,720,445'Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–1993Patents assigned to HOECHST CELANESE CORP (12)· patent assignee history
1988Patents assigned to ALLIED CORP (2)· patent assignee history
1988–1993Based in Bound Brook, NJ, US· patent location history
1988–1990Based in Middlesex, NJ, US· patent location history
1989–1991Based in Morristown, NJ, US· patent location history
1991–2003Patents assigned to ALLIED SIGNAL INC (10)· patent assignee history
1991–2004Based in Washington, NJ, US· patent location history
2000–2020Patents assigned to CORNING INC (2)· patent assignee history
2004Patents assigned to DU PONT (1)· patent assignee history
2020Based in Corning, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOECHST CELANESE CORP | 12 | 1988–1993 |
| ALLIED SIGNAL INC | 10 | 1991–2003 |
| ALLIED CORP | 2 | 1988 |
| CORNING INC | 2 | 2000–2020 |
| DU PONT | 1 | 2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Washington, New Jersey, US | 14 | 1991–2004 |
| Bound Brook, New Jersey, US | 5 | 1988–1993 |
| Middlesex, New Jersey, US | 5 | 1988–1990 |
| Morristown, New Jersey, US | 2 | 1989–1991 |
| Corning, New York, US | 1 | 2020 |