Inventor
Krishnan Shrinivasan
Inventor
San Jose, CA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1037%
C23CCoating metallic material15%
B08BCleaning in general11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
C11DDetergent compositions7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
H01JElectric discharge tubes or discharge lamps4%
H01LSemiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
F28FDetails of heat-exchange and heat-transfer apparatus, of general application2%
PatentTitleYear
9,873,946Multi-station sequential curing of dielectric films20189,835,388Systems for uniform heat transfer including adaptive portions20178,980,769'Multi-station sequential curing of dielectric films'20158,951,348'Single-chamber sequential curing of semiconductor wafers'20158,889,233'Method for reducing stress in porous dielectric films'20148,629,068'Multi-station sequential curing of dielectric films'20148,454,750'Multi-station sequential curing of dielectric films'20137,941,039'Pedestal heat transfer and temperature control'20117,503,334'Apparatus and methods for processing semiconductor substrates using supercritical fluids'20097,327,948'Cast pedestal with heating element and coaxial heat exchanger'20087,105,061'Method and apparatus for sealing substrate load port in a high pressure reactor'20066,905,556'Method and apparatus for using surfactants in supercritical fluid processing of wafers'20056,848,458'Apparatus and methods for processing semiconductor substrates using supercritical fluids'20056,848,455'Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species'20056,800,142'Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment'20046,764,552'Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials'20046,563,092'Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry'20036,550,484'Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing'20036,333,268'Method and apparatus for removing post-etch residues and other adherent matrices'20016,228,563'Method and apparatus for removing post-etch residues and other adherent matrices'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2018Patents assigned to NOVELLUS SYSTEMS INC (19)· patent assignee history
2001–2018Based in San Jose, CA, US· patent location history
2013–2015Patents assigned to SHRINIVASAN KRISHNAN (5)· patent assignee history
2013–2015Patents assigned to RIVKIN MICHAEL (3)· patent assignee history
2013–2015Patents assigned to SABRI MOHAMED (3)· patent assignee history
2013–2015Patents assigned to SMARGIASSI EUGENE (3)· patent assignee history
2014–2017Based in Bangalore, IN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NOVELLUS SYSTEMS INC | 19 | 2001–2018 |
| SHRINIVASAN KRISHNANself | 5 | 2013–2015 |
| RIVKIN MICHAEL | 3 | 2013–2015 |
| SABRI MOHAMED | 3 | 2013–2015 |
| SMARGIASSI EUGENE | 3 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 17 | 2001–2018 |
| Bangalore, IN | 3 | 2014–2017 |