Inventor
Hiroyuki Ebi
Inventor
Kyoto, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Fprimary
G01FMeasuring volume, volume flow, mass flow or liquid level19%
G01NInvestigating or analysing materials by determining their chemical or physical properties19%
G05DSystems for controlling or regulating non-electric variables13%
C23CCoating metallic material6%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light6%
G08BSignalling systems, e.g. personal calling systems6%
H04MTelephonic communication6%
H04NPictorial communication, e.g. television6%
H10DInorganic electric semiconductor devices6%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation6%
PatentTitleYear
9,026,383'Flow rate sensor'20158,219,329'Thermal type mass flow meter, and thermal type mass flow control device'20127,682,843'Semiconductor fabrication system, and flow rate correction method and program for semiconductor fabrication system'20107,015,963'CCD sensor incorporating parallel diffusion regions within the output'20066,633,231'Communication device and auxiliary device for communication'20034,501,968'Infrared radiation gas analyzer'19854,499,378'Infrared radiation gas analyzer'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–2006Patents assigned to HORIBA LTD (4)· patent assignee history
1985–2015Based in Kyoto, JP· patent location history
2003Based in Suwa, JP· patent location history
2012–2015Patents assigned to EBI HIROYUKI (2)· patent assignee history
2012–2015Patents assigned to HORIBA STEC CO LTD (2)· patent assignee history
2012Patents assigned to KITAGAWA HITOSHI (1)· patent assignee history
2012Patents assigned to MORIYA SHUJI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HORIBA LTD | 4 | 1985–2006 |
| EBI HIROYUKIself | 2 | 2012–2015 |
| HORIBA STEC CO LTD | 2 | 2012–2015 |
| KITAGAWA HITOSHI | 1 | 2012 |
| MORIYA SHUJI | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyoto, JP | 6 | 1985–2015 |
| Suwa, JP | 1 | 2003 |