Inventor

Chris Reid

Inventor
Glasgow, GB

Overview

5→
Patents
1995–2010
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
C09KMaterials for miscellaneous applications, not provided for elsewhere14%
C11DDetergent compositions7%
F21VFunctional features or details of lighting devices or systems thereof7%
F21WIndexing scheme associated with subclasses f21k, f21l, f21s and f21v, relating to uses or applications of lighting devices or systems7%
F41BWeapons for projecting missiles without use of explosive or combustible propellant charge7%
G02BOptical elements, systems or apparatus7%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995Based in Schreiber, CA· patent location history
2004–2010Patents assigned to EKC TECHNOLOGY INC (3)· patent assignee history
2004–2010Based in Glasgow, GB· patent location history
2006Patents assigned to HARRIS EARL (1)· patent assignee history
2006Patents assigned to HARRIS WENDELL (1)· patent assignee history
2006Patents assigned to REID CHRIS (1)· patent assignee history
2006Patents assigned to RUSSELL CALESE (1)· patent assignee history
2006Based in Granada Hills, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EKC TECHNOLOGY INC32004–2010
HARRIS EARL12006
HARRIS WENDELL12006
REID CHRISself12006
RUSSELL CALESE12006
Locations
LocationPatentsSpan
Glasgow, GB32004–2010
Granada Hills, California, US12006
Schreiber, CA11995