Inventor
Erik Theodorus Maria Bijlaart
Inventor
Rosmalen, NL
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices88%
G01FMeasuring volume, volume flow, mass flow or liquid level3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
10,962,891Lithographic apparatus and device manufacturing method202110,678,139Lithographic apparatus and device manufacturing method202010,527,955Lithographic apparatus and device manufacturing method202010,503,084Lithographic apparatus and device manufacturing method201910,261,428Lithographic apparatus and device manufacturing method201910,248,034Lithographic apparatus and device manufacturing method201910,180,629Lithographic apparatus and device manufacturing method20199,541,843'Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid'20179,482,966'Lithographic apparatus and device manufacturing method'20169,482,962'Lithographic apparatus and device manufacturing method'20169,152,058'Lithographic apparatus and device manufacturing method involving a member and a fluid opening'20159,081,299'Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap'20158,860,923'Lithographic apparatus and device manufacturing method'20148,638,418'Lithographic apparatus'20148,558,989'Lithographic apparatus and device manufacturing method'20138,542,344'Lithographic apparatus and device manufacturing method'20138,542,343'Lithographic apparatus'20138,482,845'Lithographic apparatus and device manufacturing method'20138,472,002'Lithographic apparatus and device manufacturing method'20138,451,422'Re-flow and buffer system for immersion lithography'20138,154,708'Lithographic apparatus and device manufacturing method'20127,868,998'Lithographic apparatus'20117,602,472'Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device'20097,593,092'Lithographic apparatus and device manufacturing method'20097,411,653'Lithographic apparatus'20087,213,963'Lithographic apparatus and device manufacturing method'20077,199,858'Lithographic apparatus and device manufacturing method'20077,193,681'Lithographic apparatus and device manufacturing method'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2021Patents assigned to ASML NETHERLANDS BV (28)· patent assignee history
2007–2021Based in Rosmalen, NL· patent location history
2012–2017Patents assigned to BIJLAART ERIK THEODORUS MARIA (13)· patent assignee history
2012–2017Patents assigned to HOOGENDAM CHRISTIAAN ALEXANDER (12)· patent assignee history
2012–2017Patents assigned to LOOPSTRA ERIK ROELOF (12)· patent assignee history
2012–2017Patents assigned to MERTENS JEROEN JOHANNES SOPHIA MARIA (12)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 28 | 2007–2021 |
| BIJLAART ERIK THEODORUS MARIAself | 13 | 2012–2017 |
| HOOGENDAM CHRISTIAAN ALEXANDER | 12 | 2012–2017 |
| LOOPSTRA ERIK ROELOF | 12 | 2012–2017 |
| MERTENS JEROEN JOHANNES SOPHIA MARIA | 12 | 2012–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rosmalen, NL | 28 | 2007–2021 |