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Inventor

Shih-Chang Shih

Inventor
Hsinchu, TW

Overview

2→
Patents
2014–2021
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G06FElectric digital data processing50%
PatentTitleYear
11,086,209EUV lithography mask with a porous reflective multilayer structure20218,893,353'Opening/closing apparatus and hinge device thereof'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014Patents assigned to WISTRON CORP (1)· patent assignee history
2014Based in New Taipei, TW· patent location history
2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (1)· patent assignee history
2021Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD12021
WISTRON CORP12014
Locations
LocationPatentsSpan
Hsinchu, TW12021
New Taipei, TW12014