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Inventor

KOEN STEFFENS

Inventor
NL

Overview

3→
Patents
2022–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
H01LSemiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
PatentTitleYear
12,197,140Substrate table, immersion lithographic apparatus and device manufacturing method202512,072,636Fluid handling system and lithographic apparatus202411,215,933Substrate table, immersion lithographic apparatus and device manufacturing method2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2022–2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32022–2025
Locations
LocationPatentsSpan
NL32022–2025