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Inventor

Ming-Hsun Yang

Inventor
Taipei, TW

Overview

21→
Patents
2000–2017
Patent span
Performing operations
Primary field (CPC B)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Jprimary
B41JTypewriters29%
Y10TTechnical subjects covered by former us classification18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
G06FElectric digital data processing9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
A61CDentistry3%
B08BCleaning in general3%
C30BSingle-crystal growth3%
E21BEarth or rock drilling3%
G01VGeophysics3%
PatentTitleYear
9,816,372'Highly-integrated well logging surface system'20178,920,165'Self-locking and positioning device for dental brace'20148,050,453'Robust object tracking system'20117,002,794'Portable computer and base member receiving arrangement'20066,981,300'Piezoelectric ink jet print head and fabrication method for a pressure chamber thereof'20066,966,634'Ink supply structure for inkjet printhead'20056,940,713'Portable computer standing support structure'20056,937,468'Portable computer and portable docking station arrangement'20056,857,186'Method of manufacturing a piezoelectric print-head'2005D0494164'Tablet personal computer'20046,773,094'Method of using photolithography and etching for forming a nozzle plate of an inkjet print head'20046,701,593'Process for producing inkjet printhead'20046,699,399'Self-cleaning etch process'20046,682,177'Ink supply structure for inkjet printhead'20046,676,769'Apparatus and method for cleaning a furnace torch'20046,592,210'Piezoelectric print-head and method of manufacture'20036,538,237'Apparatus for holding a quartz furnace'20036,364,455'Printhead of ink jet printing apparatus and manufacturing method therefor'20026,247,807'Ink-jet cartridge'20016,151,052'Ink jet cartridge for an ink jet printing apparatus'20006,136,211'Self-cleaning etch process'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2002Patents assigned to WISERTEK INTERNAT CORP (3)· patent assignee history
2000–2004Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2000–2006Based in Taipei, TW· patent location history
2000–2014Based in Hsinchu, TW· patent location history
2003–2006Patents assigned to NANODYNAMICS INC (7)· patent assignee history
2003–2004Patents assigned to TAIWAN SEMICONDUCTOR MFG (2)· patent assignee history
2003–2004Based in Tainan, TW· patent location history
2004–2006Patents assigned to TATUNG CO LTD (4)· patent assignee history
2011Based in Evanston, IL, US· patent location history
2017Based in Beijing, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NANODYNAMICS INC72003–2006
TATUNG CO LTD42004–2006
WISERTEK INTERNAT CORP32000–2002
APPLIED MATERIALS INC22000–2004
TAIWAN SEMICONDUCTOR MFG22003–2004
Locations
LocationPatentsSpan
Taipei, TW112000–2006
Hsinchu, TW62000–2014
Tainan, TW22003–2004
Beijing, CN12017
Evanston, Illinois, US12011