Inventor

Yuichi Takenaga

Inventor
Tokyo, JP

Overview

45→
Patents
2004–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 45 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
C23CCoating metallic material15%
H01LSemiconductor devices15%
LOC1313%
G05BControl or regulating systems in general8%
H01RElectrically-conductive connections8%
Y02PClimate change mitigation technologies in the production or processing of goods4%
B05CApparatus for applying fluent materials to surfaces, in general2%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace2%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
D0908635Electrical connector2021D0908636Electrical connector202110,692,782Control device, substrate processing system, substrate processing method, and program202010,640,871Heat treatment system, heat treatment method, and program202010,607,869Substrate processing system and control device2020D0877704Electrical connector202010,545,478Substrate processing system, control device, group controller, and host computer202010,516,228Connector having a mechanism which prevents plastic deformation of a terminal201910,504,803Substrate processing system, control device, and film deposition method and program2019D0866477Electrical connector201910,395,934Control device, substrate processing system, substrate processing method, and program201910,236,223Substrate processing method, program, apparatus and system to determine substrate processing result201910,186,429Heat treatment apparatus, heat treatment method, and program201910,096,499Substrate processing method, program, control apparatus, film forming apparatus, and substrate processing system201810,050,071Imaging unit, lens barrel, and portable terminal20189,899,771'Connector'20189,798,317'Substrate processing method and control apparatus'20179,799,577'Heat treatment system, heat treatment method, and program'20179,772,624'Control apparatus, substrate processing apparatus, and substrate processing system'20179,543,675'Board-to-board connector assembly and connector'2017D0774464'Electrical connector'20169,484,648'Connector'20169,453,683'Heat treatment system, heat treatment method, and program'20169,300,064'Connector'20169,259,761'Heat treatment system, heat treatment method, and non-transitory computer-readable recording medium'20169,147,969'Connector with adjustable locking force'2015D0726657'Electrical connector'2015D0720298'Electrical connector part'20148,840,407'Connector'20148,821,174'Floating connector small in size and improved in strength'2014D0703615'Electrical connector'2014D0703146'Electrical connector'20148,664,013'Continuous processing system, continuous processing method, and program'2014D0699192'Electrical connector'2014D0696201'Electrical connector'2013D0695692'Electrical connector'20138,354,135'Thermal processing apparatus, method for regulating temperature of thermal processing apparatus, and program'20138,082,054'Method of optimizing process recipe of substrate processing system'20118,055,372'Processing system, processing method, and computer program'20117,953,512'Substrate processing system, control method for substrate processing apparatus and program stored on medium'20117,738,983'Method of optimizing process recipe of substrate processing system'20107,575,370'Heat treatment apparatus and method of calibrating the apparatus'20097,139,627'Calibration of plural processing systems'20066,975,917'Heat treatment method and heat treatment device'20056,744,957'Image fiber imaging apparatus'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2020Patents assigned to TOKYO ELECTRON LTD (22)· patent assignee history
2005–2021Based in Tokyo, JP· patent location history
2010–2013Based in Nirasaki, JP· patent location history
2011–2014Patents assigned to TAKENAGA YUICHI (4)· patent assignee history
2013–2016Patents assigned to JAPAN AVIATION ELECTRON (11)· patent assignee history
2014–2016Patents assigned to JAE ELECTRONICS INC (3)· patent assignee history
2014–2016Based in Oshu, JP· patent location history
2016–2021Patents assigned to JAPAN AVIATION ELECTRONICS IND LTD (9)· patent assignee history
2017–2020Based in Iwate, JP· patent location history
2019–2020Based in Yamanashi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD222005–2020
JAPAN AVIATION ELECTRON112013–2016
JAPAN AVIATION ELECTRONICS IND LTD92016–2021
TAKENAGA YUICHIself42011–2014
JAE ELECTRONICS INC32014–2016
Locations
LocationPatentsSpan
Tokyo, JP242005–2021
Iwate, JP92017–2020
Nirasaki, JP52010–2013
Yamanashi, JP32019–2020
Oshu, JP32014–2016