Inventor

Nobukatu Kimura

Inventor

Inuyama, JP

Overview

2006

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C10Mprimary

C10MLubricating compositions50%

C10NIndexing scheme associated with subclass c10m relating to lubricating compositions50%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2006Patents assigned to DAIDO METAL CO (1)· patent assignee history

2006Based in Inuyama, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
DAIDO METAL CO	1	2006

Locations

Location	Patents	Span
Inuyama, JP	1	2006