Inventor
Xiaolan Ba
Inventor
San Jose, CA, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1021%
C23CCoating metallic material18%
H10DInorganic electric semiconductor devices11%
H10BElectronic memory devices7%
PatentTitleYear
10,546,751Forming low resistivity fluorine free tungsten film without nucleation20209,978,605Method of forming low resistivity fluorine free tungsten film without nucleation20189,754,824'Tungsten films having low fluorine content'20179,633,861'Cu/barrier interface enhancement'20179,613,818'Deposition of low fluorine tungsten by sequential CVD process'20179,580,801'Enhancing electrical property and UV compatibility of ultrathin blok barrier film'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2020Patents assigned to LAM RES CORP (4)· patent assignee history
2017Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2017–2020Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 4 | 2017–2020 |
| APPLIED MATERIALS INC | 2 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 6 | 2017–2020 |