Inventor

Yoshiyuki Harita

Inventor

Kawasaki, JP

Overview

23→

Patents

1976–2001

Patent span

Physics

Primary field (CPC G)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%

C08JWorking-up14%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients6%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%

C08CTreatment or chemical modification of rubbers2%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%

C11DDetergent compositions2%

C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis2%

G03CPhotosensitive materials for photographic purposes2%

PatentTitleYear

6,270,939'Radiation-sensitive resin composition'2001 6,228,554'Radiation-sensitive resin composition'2001 6,020,104'Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent'2000 5,925,492'Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent'1999 5,494,784'Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent'1996 5,405,720'Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent'1995 5,238,774'Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent'1993 5,215,857'1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent'1993 5,087,548'Positive type radiation-sensitive resin composition'1992 4,963,463'Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group'1990 4,957,588'Method for high temperature reaction process'1990 4,886,565'Reactive ion etching apparatus'1989 4,623,609'Process for forming patterns using ionizing radiation sensitive resist'1986 4,499,171'Positive type photosensitive resin composition with at least two o-quinone diazides'1985 4,407,927'Photoresist composition'1983 4,384,037'Positive type photosensitive resin composition'1983 4,349,619'Photoresist composition'1982 4,330,612'Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer'1982 4,294,908'Photoresist composition containing modified cyclized diene polymers'1981 4,275,142'Photosensitive compositions and printing plates containing same'1981 4,169,068'Stripping liquor composition for removing photoresists comprising hydrogen peroxide'1979 4,106,943'Photosensitive cross-linkable azide containing polymeric composition'1978 3,948,667'Photosensitive compositions'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–1996Patents assigned to JAPAN SYNTHETIC RUBBER CO LTD (18)· patent assignee history

1976–1978Based in Yokohama, JP· patent location history

1979–2001Based in Kawasaki, JP· patent location history

1989Based in Kanagawa, JP· patent location history

1990Patents assigned to UCB SA (2)· patent assignee history

1990Based in Shirahatadai, JP· patent location history

1992Patents assigned to JAPAN SYNTHETIC RUBBER CO INC (1)· patent assignee history

1999–2001Patents assigned to JSR CORP (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
JAPAN SYNTHETIC RUBBER CO LTD	18	1976–1996
JSR CORP	4	1999–2001
UCB SA	2	1990
JAPAN SYNTHETIC RUBBER CO INC	1	1992

Locations

Location	Patents	Span
Kawasaki, JP	19	1979–2001
Yokohama, JP	2	1976–1978
Shirahatadai, JP	1	1990
Kanagawa, JP	1	1989