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Inventor

Donald Racicot

Inventor
Providence, RI, US

Overview

4→
Patents
2003–2016
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds13%
C08LCompositions of macromolecular compounds13%
H05KPrinted circuits13%
Y10TTechnical subjects covered by former us classification13%
PatentTitleYear
9,519,216'Positive photosensitive resin compositions'20167,803,510'Positive photosensitive polybenzoxazole precursor compositions'20107,101,652'Photosensitive resin compositions'20066,511,789'Photosensitive polyimide precursor compositions'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2006Patents assigned to ARCH SPEC CHEM INC (2)· patent assignee history
2003–2016Based in Providence, RI, US· patent location history
2010Patents assigned to FUJIFILM ELECTRONIC MATERIALS (1)· patent assignee history
2016Patents assigned to FUJIFILM ELECTRONIC MAT USA INC (1)· patent assignee history
2016Patents assigned to NAIINI AHMAD A (1)· patent assignee history
2016Patents assigned to RACICOT DONALD W (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ARCH SPEC CHEM INC22003–2006
FUJIFILM ELECTRONIC MAT USA INC12016
FUJIFILM ELECTRONIC MATERIALS12010
NAIINI AHMAD A12016
RACICOT DONALD Wself12016
Locations
LocationPatentsSpan
Providence, RI, US42003–2016