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Inventor

Johannes Hubertus Josephina Moors

Inventor
Helmond, NL

Overview

2→
Patents
2013
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
B08BCleaning in general20%
G21KHandling of particles or ionising radiation not otherwise provided for20%
H05GX-ray technique20%
PatentTitleYear
8,419,862'Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor'20138,373,846'Radiation source, lithographic apparatus and device manufacturing method'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2013Patents assigned to JOSEPHINA MOORS JOHANNES HUBERTUS (2)· patent assignee history
2013Patents assigned to BANINE VADIM YEVGENYEVICH (1)· patent assignee history
2013Patents assigned to EHM DIRK HEINRICH (1)· patent assignee history
2013Patents assigned to LOOPSTRA ERIK ROELOF (1)· patent assignee history
2013Based in Helmond, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22013
JOSEPHINA MOORS JOHANNES HUBERTUSself22013
BANINE VADIM YEVGENYEVICH12013
EHM DIRK HEINRICH12013
LOOPSTRA ERIK ROELOF12013
Locations
LocationPatentsSpan
Helmond, NL22013