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Inventor

John Latza

Inventor
Lindenhurst, NY, US

Overview

2→
Patents
1994–1996
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests33%
PatentTitleYear
5,571,329'Gas flow system for CVD reactor'19965,360,509'Low cost method of fabricating epitaxial semiconductor devices'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–1996Patents assigned to GI CORP (2)· patent assignee history
1994–1996Based in Lindenhurst, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
GI CORP21994–1996
Locations
LocationPatentsSpan
Lindenhurst, New York, US21994–1996