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Inventor

Craig A. Outten

Inventor
Buffalo, NY, US

Overview

5→
Patents
2000–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps36%
C23CCoating metallic material18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
B26BHand-held cutting tools not otherwise provided for9%
H05HPlasma technique9%
Y10TTechnical subjects covered by former us classification9%
PatentTitleYear
10,815,570Linearized energetic radio-frequency plasma ion source202010,573,495Self-neutralized radio frequency plasma ion source20206,486,597'Electrically tunable low secondary electron emission diamond-like coatings and process for depositing coatings'20026,468,642'Fluorine-doped diamond-like coatings'20026,013,980'Electrically tunable low secondary electron emission diamond-like coatings and process for depositing coatings'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000Patents assigned to ADVANCED REFRACTORY TECH (1)· patent assignee history
2000–2002Based in Buffalo, NY, US· patent location history
2002Patents assigned to BEKAERT SA NV (2)· patent assignee history
2020Patents assigned to DENTON VACUUM L L C (1)· patent assignee history
2020Patents assigned to DENTON VACUUM LLC (1)· patent assignee history
2020Based in Rydal, PA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BEKAERT SA NV22002
ADVANCED REFRACTORY TECH12000
DENTON VACUUM L L C12020
DENTON VACUUM LLC12020
Locations
LocationPatentsSpan
Buffalo, New York, US32000–2002
Rydal, Pennsylvania, US22020