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Inventor

Chelsea Dang

Inventor
Pflugerville, TX, US

Overview

2→
Patents
1999–2000
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Fprimary
C23FNon-mechanical removal of metallic material from surface29%
B24BMachines, devices, or processes for grinding or polishing14%
C09GPolishing compositions14%
C09KMaterials for miscellaneous applications, not provided for elsewhere14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
PatentTitleYear
6,096,652'Method of chemical mechanical planarization using copper coordinating ligands'20005,897,375'Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2000Patents assigned to MOTOROLA INC (2)· patent assignee history
1999Based in Plugerville, TX, US· patent location history
2000Based in Pflugerville, TX, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MOTOROLA INC21999–2000
Locations
LocationPatentsSpan
Pflugerville, Texas, US12000
Plugerville, Texas, US11999