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Inventor

Yuntao Jiang

Inventor
Shanghai, CN

Overview

2→
Patents
2018
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing20%
G01BMeasuring length, thickness or similar linear dimensions20%
G02BOptical elements, systems or apparatus20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
10,099,339Chemical mechanical polishing (CMP) apparatus and method20189,915,519'Measuring system and measuring method'2018

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to SEMICONDUCTOR MFG INT SHANGHAI CORP (2)· patent assignee history
2018Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEMICONDUCTOR MFG INT SHANGHAI CORP22018
Locations
LocationPatentsSpan
Shanghai, CN22018