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Inventor

GUIPENG TIE

Inventor
CN

Overview

2→
Patents
2023–2025
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing40%
B24CAbrasive or related blasting with particulate material20%
G06FElectric digital data processing20%
H01JElectric discharge tubes or discharge lamps20%
PatentTitleYear
12,296,430Jet polishing device for stably forming shape of gaussian removal function202511,658,005Method for controlling dynamically controllable ultrawide-amplitude and high-response ion source2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to NATIONAL UNIV OF DEFENSE TECHNOLOGY PEOPLES LIBERATION ARMY OF CHINA (1)· patent assignee history
2023–2025Based in CN· patent location history
2025Patents assigned to NATIONAL UNIV OF DEFENSE TECHNOLOGY (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NATIONAL UNIV OF DEFENSE TECHNOLOGY12025
NATIONAL UNIV OF DEFENSE TECHNOLOGY PEOPLES LIBERATION ARMY OF CHINA12023
Locations
LocationPatentsSpan
CN22023–2025