Inventor
Jeroen Jonkers
Inventor
Aachen, DE
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
H05GX-ray technique22%
B82YSpecific uses or applications of nanostructures16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
G02BOptical elements, systems or apparatus6%
G21KHandling of particles or ionising radiation not otherwise provided for6%
H01JElectric discharge tubes or discharge lamps6%
B08BCleaning in general2%
H05HPlasma technique2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
9,414,476'Method and device for generating optical radiation by means of electrically operated pulsed discharges'20168,749,178'Electrode system, in particular for gas discharge light sources'20148,633,572'Low ohmic through substrate interconnection for semiconductor carriers'20148,253,123'Method and device for generating EUV radiation or soft X-rays with enhanced efficiency'20128,173,975'Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation'20128,040,030'Method of increasing the conversion efficiency of an EUV and/or soft X-ray lamp and a corresponding apparatus'20117,897,948'EUV plasma discharge lamp with conveyor belt electrodes'20117,852,460'Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method'20107,688,948'Method and apparatus for generating radiation in the wavelength range from about 1 nm to about 30 nm, and use in a lithography device or in metrology'20107,671,965'Lithographic projection apparatus, device manufacturing method and device manufactured thereby'20107,518,300'Method and device for the generation of a plasma through electric discharge in a discharge space'20097,427,766'Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiation'20087,397,190'Gas discharge lamp for extreme UV radiation'20087,315,346'Lithographic apparatus and device manufacturing method'20087,170,586'Lithographic apparatus and device manufacturing method'20077,088,424'Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method'20067,030,963'Lithographic apparatus and device manufacturing method'20067,026,629'Lithographic apparatus and device manufacturing method'20066,987,275'Lithographic apparatus and device manufacturing method'20066,859,259'Lithographic projection apparatus and reflector assembly for use therein'20056,714,279'Lithographic projection apparatus, device manufacturing method and device manufactured thereby'20046,683,936'EUV-transparent interface structure'20046,576,912'Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2010Based in Eindhoven, NL· patent location history
2004–2010Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2004–2012Patents assigned to KONINKL PHILIPS ELECTRONICS NV (10)· patent assignee history
2005–2014Based in Aachen, DE· patent location history
2006–2010Based in Aaschen, DE· patent location history
2012–2016Patents assigned to JONKERS JEROEN (5)· patent assignee history
2014Patents assigned to KONINKL PHILIPS NV (2)· patent assignee history
2014Patents assigned to APETZ ROLF THEO ANTON (1)· patent assignee history
2016Based in Berlin, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 10 | 2004–2010 |
| KONINKL PHILIPS ELECTRONICS NV | 10 | 2004–2012 |
| JONKERS JEROENself | 5 | 2012–2016 |
| KONINKL PHILIPS NV | 2 | 2014 |
| APETZ ROLF THEO ANTON | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aachen, DE | 16 | 2005–2014 |
| Eindhoven, NL | 4 | 2003–2010 |
| Aaschen, DE | 2 | 2006–2010 |
| Berlin, DE | 1 | 2016 |