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Inventor

TOMOYUKI IMADA

Inventor
JP

Overview

3→
Patents
2022
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds29%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds14%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C08LCompositions of macromolecular compounds14%
PatentTitleYear
11,487,204Resist material202211,472,763Calixarene compound, curable composition, and cured product202211,254,778Novolak resins and resist materials2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022Patents assigned to DAINIPPON INK & CHEMICALS (3)· patent assignee history
2022Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DAINIPPON INK & CHEMICALS32022
Locations
LocationPatentsSpan
JP32022