Inventor
WEI-HAN LAI
Inventor
TW
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
H10DInorganic electric semiconductor devices5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%
C07DHeterocyclic compounds2%
C08LCompositions of macromolecular compounds2%
B05DProcesses for applying fluent materials to surfaces, in general1%
PatentTitleYear
12,578,641Photoresist and method of manufacturing a semiconductor device202612,566,374Photoresist composition and method of manufacturing semiconductor device202612,504,693Photoresist composition and method of manufacturing a semiconductor device202512,476,107Method of manufacturing a semiconductor device202512,347,683Method of manufacturing a semiconductor device202512,300,507Method of manufacturing a semiconductor device202512,191,147Coating composition for photolithography202512,189,293Method of manufacturing a semiconductor device202512,189,296Lithography process and material for negative tone development202512,189,287Photoresist composition and method of forming photoresist pattern202512,148,610Spin on carbon composition and method of manufacturing a semiconductor device202412,134,690Photoresist composition and method of manufacturing a semiconductor device202412,074,027Underlayer of multilayer structure and methods of use thereof202412,054,699Perfusion cell culture device and perfusion cell culture system202411,955,336Method of manufacturing a semiconductor device202411,935,757Method of manufacturing a semiconductor device202411,914,301Photoresist, method of manufacturing a semiconductor device and method of extreme ultraviolet lithography202411,809,080Extreme ultraviolet photoresist with high-efficiency electron transfer202311,796,918Underlayer material for photoresist202311,728,161Spin on carbon composition and method of manufacturing a semiconductor device202311,714,355Photoresist composition and method of forming photoresist pattern202311,626,293Method of manufacturing a semiconductor device202311,594,511Bonding device and bonding method202311,550,220Negative tone photoresist for EUV lithography202311,476,108Spin on carbon composition and method of manufacturing a semiconductor device202211,422,465Extreme ultraviolet photoresist with high-efficiency electron transfer202211,295,961Method of manufacturing a semiconductor device202211,269,256Underlayer material for photoresist202211,143,963Negative tone developer for extreme ultraviolet lithography2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (27)· patent assignee history
2021–2026Based in TW· patent location history
2023Patents assigned to ADVANCED SEMICONDUCTOR ENG (1)· patent assignee history
2024Patents assigned to UNIV NAT TSING HUA (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 27 | 2021–2026 |
| ADVANCED SEMICONDUCTOR ENG | 1 | 2023 |
| UNIV NAT TSING HUA | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 29 | 2021–2026 |