Inventor

Mituo Kawai

Inventor

Yokohama, JP

Overview

27→

Patents

1982–2002

Patent span

Chemistry

Primary field (CPC C)

Patents· 27 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material24%

C22CAlloys19%

C22BProduction and refining of metals10%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

Y10TTechnical subjects covered by former us classification7%

C04BLime, magnesia6%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

H10DInorganic electric semiconductor devices4%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%

B23KSoldering or unsoldering3%

PatentTitleYear

6,400,025'Highly purified titanium material, method for preparation of it and sputtering target using it'2002 6,210,634'Highly purified titanium material, method for preparation of it and sputtering target using it'2001 5,679,983'Highly purified metal material and sputtering target using the same'1997 5,612,571'Sputtered silicide film'1997 5,584,906'Highly purified titanium material, method for preparation of it and sputtering target using it'1996 5,530,467'Sputtering target, film resistor and thermal printer head'1996 5,508,000'Sputtering target and method of manufacturing the same'1996 5,470,527'Ti-W sputtering target and method for manufacturing same'1995 5,458,697'Highly purified metal material and sputtering target using the same'1995 5,418,071'Sputtering target and method of manufacturing the same'1995 5,409,517'Sputtering target and method of manufacturing the same'1995 5,370,837'High temperature heat-treating jig'1994 5,288,561'High temperature heat-treating jig'1994 5,204,057'Highly purified titanium material and its named article, a sputtering target'1993 5,196,916'Highly purified metal material and sputtering target using the same'1993 4,963,240'Sputtering alloy target and method of producing an alloy film'1990 4,857,120'Heat-resisting steel turbine part'1989 4,842,706'Sputtering target'1989 4,820,954'Indirectly heated cathode structure for electron tubes'1989 4,754,950'Valve'1988 4,585,620'Wear-resistant alloy for an atomic power plant'1986 4,514,234'Molybdenum board and process of manufacturing the same'1985 4,493,733'Corrosion-resistant non-magnetic steel retaining ring for a generator'1985 4,431,446'High cavitation erosion resistance stainless steel and hydraulic machines being made of the same'1984 4,406,698'Martensitic stainless cast steel having high cavitation erosion resistance'1983 4,400,346'Control rods'1983 4,316,743'High damping Fe-Cr-Al alloy'1982

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1982–1986Patents assigned to TOKYO SHIBAURA ELECTRIC CO (7)· patent assignee history

1982–2002Based in Yokohama, JP· patent location history

1988–2002Patents assigned to TOSHIBA KK (20)· patent assignee history

1994–1995Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOSHIBA KK	20	1988–2002
TOKYO SHIBAURA ELECTRIC CO	7	1982–1986

Locations

Location	Patents	Span
Yokohama, JP	23	1982–2002
Kanagawa, JP	4	1994–1995