Inventor
Andre Poock
Inventor
Malschwitz, DE
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
H10DInorganic electric semiconductor devices20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
PatentTitleYear
8,660,681'Method and system for excursion monitoring in optical lithography processes in micro device fabrication'20147,977,225'Reducing implant degradation in tilted implantations by shifting implantation masks'20117,887,978'Method of detecting repeating defects in lithography masks on the basis of test substrates exposed under varying conditions'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2014Patents assigned to GLOBALFOUNDRIES INC (3)· patent assignee history
2011–2014Based in Malschwitz, DE· patent location history
2011Based in Maischwitz, DE· patent location history
2014Patents assigned to POOCK ANDRE (1)· patent assignee history
2014Patents assigned to SCHOLTZ HEIKE (1)· patent assignee history
2014Patents assigned to ZSCHAEBITZ DANIEL (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| GLOBALFOUNDRIES INC | 3 | 2011–2014 |
| POOCK ANDREself | 1 | 2014 |
| SCHOLTZ HEIKE | 1 | 2014 |
| ZSCHAEBITZ DANIEL | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Malschwitz, DE | 2 | 2011–2014 |
| Maischwitz, DE | 1 | 2011 |