Inventor
Zhengquan Tan
Inventor
Cupertino, CA, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C23CCoating metallic material22%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1016%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
G01BMeasuring length, thickness or similar linear dimensions4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
B08BCleaning in general2%
G06FElectric digital data processing2%
H01JElectric discharge tubes or discharge lamps2%
PatentTitleYear
10,663,286Measuring thin films on grating and bandgap on grating202010,458,912Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity201910,013,518Model building and analysis engine for combined X-ray and optical metrology20187,349,079'Methods for measurement or analysis of a nitrogen concentration of a specimen'20087,196,021'HDP-CVD deposition process for filling high aspect ratio gaps'20077,159,597'Multistep remote plasma clean process'20077,064,077'Method for high aspect ratio HDP CVD gapfill'20066,929,700'Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD'20056,914,016'HDP-CVD deposition process for filling high aspect ratio gaps'20056,812,153'Method for high aspect ratio HDP CVD gapfill'20046,740,601'HDP-CVD deposition process for filling high aspect ratio gaps'20046,715,496'Method and apparatus for cleaning a semiconductor wafer processing system'20046,682,603'Substrate support with extended radio frequency electrode upper surface'20046,596,653'Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD'20036,596,123'Method and apparatus for cleaning a semiconductor wafer processing system'20036,423,384'HDP-CVD deposition of low dielectric constant amorphous carbon film'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2007Patents assigned to APPLIED MATERIALS INC (12)· patent assignee history
2002–2020Based in Cupertino, CA, US· patent location history
2008Patents assigned to KLA TENCOR TECH CORP (1)· patent assignee history
2018–2020Patents assigned to KLA TENCOR CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 12 | 2002–2007 |
| KLA TENCOR CORP | 3 | 2018–2020 |
| KLA TENCOR TECH CORP | 1 | 2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Cupertino, California, US | 16 | 2002–2020 |