LexDanaLexDanabeta
Inventor

Takayuki Enda

Inventor
Fukushima, JP

Overview

13→
Patents
1997–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
H10BElectronic memory devices18%
H01LSemiconductor devices7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
H10DInorganic electric semiconductor devices4%
PatentTitleYear
9,570,396'Method of forming a damascene interconnect on a barrier layer'20179,396,959'Semiconductor device with stop layers and fabrication method using ceria slurry'20168,344,510'Semiconductor device with void detection monitor'20138,222,147'Semiconductor device with stop layers and fabrication method using ceria slurry'20128,008,778'Semiconductor device'20117,902,056'Plasma treated metal silicide layer formation'20117,901,954'Method for detecting a void'20117,679,194'Method of fabricating semiconductor memory device and semiconductor memory device driver'20107,453,116'Semiconductor memory device and method of fabricating the same'20087,037,780'Semiconductor memory device and method of fabricating the same'20066,794,248'Method of fabricating semiconductor memory device and semiconductor memory device driver'20046,007,732'Reduction of reflection by amorphous carbon'19995,656,128'Reduction of reflection by amorphous carbon'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–1999Patents assigned to FUJITSU LTD (2)· patent assignee history
1997–1999Based in Kawasaki, JP· patent location history
2004–2010Patents assigned to FUJITSU AMD SEMICONDUCTOR LTD (2)· patent assignee history
2004–2017Based in Fukushima, JP· patent location history
2006–2010Based in Aizuwakamatsu, JP· patent location history
2008–2013Patents assigned to SPANSION LLC (6)· patent assignee history
2012–2017Patents assigned to ENDA TAKAYUKI (4)· patent assignee history
2012–2016Patents assigned to MORIYA MASAYUKI (2)· patent assignee history
2016Based in Fukuchima-ken, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SPANSION LLC62008–2013
ENDA TAKAYUKIself42012–2017
FUJITSU AMD SEMICONDUCTOR LTD22004–2010
FUJITSU LTD21997–1999
MORIYA MASAYUKI22012–2016
Locations
LocationPatentsSpan
Fukushima, JP72004–2017
Aizuwakamatsu, JP32006–2010
Kawasaki, JP21997–1999
Fukuchima-ken, JP12016