Inventor
PIL KYUN HEO
Inventor
KR
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01LSemiconductor devices24%
B08BCleaning in general10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
F26BDrying solid materials or objects by removing liquid therefrom6%
B05CApparatus for applying fluent materials to surfaces, in general2%
B23KSoldering or unsoldering2%
B29CShaping or joining of plastics2%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts2%
B29LIndexing scheme associated with subclass b29c, relating to particular articles2%
PatentTitleYear
12,588,452Substrate processing apparatus and method thereof202612,575,358Flow resistance generating unit and substrate treating apparatus including the same202612,463,086Substrate treating apparatus and substrate treating method202512,429,283Method and apparatus for treating a substrate202512,337,356Moving assembly for recovery guard and substrate processing apparatus202512,300,519Surface treatment method202512,094,733Substrate treatment apparatus202412,046,466Method and apparatus for treating substrate202411,940,734Apparatus and method for treating substrate202411,923,216Apparatus and method for treating substrate including process chambers and transfer chamber202411,887,883Heterogeneous composite material and method for producing the same202411,804,371Substrate treatment apparatus and method of performing treatment process on substrate202311,764,084Surface treatment apparatus and surface treatment method202311,682,577Spin head, apparatus and method for treating a substrate including the spin head202311,495,467Method and apparatus for etching thin layer2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to SEMES CO LTD (15)· patent assignee history
2022–2026Based in KR· patent location history
2024–2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEMES CO LTD | 15 | 2022–2026 |
| SAMSUNG ELECTRONICS CO LTD | 2 | 2024–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 15 | 2022–2026 |