Inventor

Michael Hatzakis

Inventor

Chappaqua, NY, US

Overview

32→

Patents

1976–2001

Patent span

Physics

Primary field (CPC G)

Patents· 32 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%

H05KPrinted circuits8%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

H05BElectric heating5%

Y10TTechnical subjects covered by former us classification5%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%

Y02BClimate change mitigation technologies related to buildings, e.g. housing, house appliances or related end-user applications4%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%

PatentTitleYear

6,296,989'Silylation of epoxy-containing photoresist films'2001 6,097,019'Radiation control system'2000 5,837,978'Radiation control system'1998 5,565,529'Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability'1996 5,340,914'Microwave processing'1994 5,241,040'Microwave processing'1993 5,238,773'Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups'1993 5,171,992'Nanometer scale probe for an atomic force microscope, and method for making same'1992 5,141,817'Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability'1992 5,115,095'Epoxy functional organosilicon polymer'1992 5,110,711'Method for forming a pattern'1992 5,098,816'Method for forming a pattern of a photoresist'1992 5,059,512'Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions'1991 5,041,358'Negative photoresist and use thereof'1991 4,981,909'Plasma-resistant polymeric material, preparation thereof, and use thereof'1991 4,782,008'Plasma-resistant polymeric material, preparation thereof, and use thereof'1988 4,693,960'Photolithographic etching process using organosilicon polymer composition'1987 4,678,850'Halogenated polystyrenes for electron beam, X-ray and photo resists'1987 4,603,195'Organosilicon compound and use thereof in photolithography'1986 4,581,100'Mixed excitation plasma etching system'1986 4,379,833'Self-aligned photoresist process'1983 4,259,369'Image hardening process'1981 4,212,935'Method of modifying the development profile of photoresists'1980 4,156,745'Electron sensitive resist and a method preparing the same'1979 4,142,107'Resist development control system'1979 4,087,569'Prebaking treatment for resist mask composition and mask making process using same'1978 4,086,870'Novel resist spinning head'1978 4,035,522'X-ray lithography mask'1977 4,024,293'High sensitivity resist system for lift-off metallization'1977 4,001,061'Single lithography for multiple-layer bubble domain devices'1977 3,984,582'Method for preparing positive resist image'1976 3,957,552'Method for making multilayer devices using only a single critical masking step'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–2000Patents assigned to IBM (31)· patent assignee history

1976–1980Based in Ossining, NY, US· patent location history

1981–1998Based in Chappaqua, NY, US· patent location history

2000Based in Drexel Hill, PA, US· patent location history

2001Patents assigned to NAT CT SCIENT RES DEMOKRITOS (1)· patent assignee history

2001Based in Attiki, GR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
IBM	31	1976–2000
NAT CT SCIENT RES DEMOKRITOS	1	2001

Locations

Location	Patents	Span
Chappaqua, New York, US	20	1981–1998
Ossining, New York, US	10	1976–1980
Attiki, GR	1	2001
Drexel Hill, Pennsylvania, US	1	2000