Inventor

Shigeru Matsui

Inventor
Hitachinaka, JP

Overview

87→
Patents
1977–2018
Patent span
Physics
Primary field (CPC G)

Patents· 87 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties45%
G01RMeasuring electric variables9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G06TImage data processing or generation, in general5%
G11BInformation storage based on relative movement between record carrier and transducer4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H01JElectric discharge tubes or discharge lamps3%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
B29CShaping or joining of plastics2%
B29DProducing particular articles from plastics or from substances in a plastic state2%
PatentTitleYear
9,945,993Curved grating, method for manufacturing the same, and optical device20189,709,714'Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same'20179,631,924'Surface profile measurement method and device used therein'20179,390,934'Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device'20169,157,866'Light source device, surface inspecting apparatus using the device, and method for calibrating surface inspecting apparatus using the device'20159,046,499'Surface inspecting apparatus and surface inspecting method'20158,934,092'Surface defect inspection method and apparatus'20158,878,119'Optical inspection method and optical inspection apparatus'20148,823,929'Inspection apparatus'2014RE044977'Method for detecting particles and defects and inspection equipment thereof'20148,743,357'Light source device, surface inspecting apparatus using the device, and method for calibrating surface inspecting apparatus using the device'20148,699,017'Appearance inspection apparatus'2014RE044840'Method for detecting particles and defects and inspection equipment thereof'20148,542,354'Inspection apparatus'20138,493,557'Surface inspecting apparatus and surface inspecting method'20138,462,327'Appearance inspection apparatus'20138,400,629'Surface defect inspection method and apparatus'20138,305,568'Surface inspection method and surface inspection apparatus'20128,246,803'Capillary electrophoresis apparatus and electrophoresis method'20128,248,594'Surface inspection method and surface inspection apparatus'20128,243,263'Optical inspection method and optical inspection apparatus'20128,169,606'Appearance inspection apparatus'20128,160,352'Surface inspection method and surface inspection apparatus'20128,094,298'Method for detecting particles and defects and inspection equipment thereof'20128,035,808'Surface defect inspection method and apparatus'20117,990,530'Optical inspection method and optical inspection apparatus'20117,973,922'Optical inspection method and optical inspection apparatus'20117,952,701'Surface inspection method and inspecting device using the same'20117,916,287'Surface inspection method and surface inspection apparatus'20117,872,742'Surface inspection method and surface inspection apparatus'20117,853,068'Pattern defect inspection method and apparatus'20107,773,210'Appearance inspection apparatus'20107,764,367'Surface inspection method and surface inspection apparatus'20107,761,246'Surface inspection method and surface inspection apparatus'20107,755,751'Optical inspection method and optical inspection apparatus'20107,719,669'Surface inspection method and surface inspection apparatus'20107,710,557'Surface defect inspection method and apparatus'20107,671,980'Surface inspection method and surface inspection apparatus'20107,619,729'Method for detecting particles and defects and inspection equipment thereof'20097,616,805'Pattern defect inspection method and apparatus'20097,602,482'Optical inspection method and optical inspection apparatus'20097,557,911'Appearance inspection apparatus'20097,558,683'Method for inspecting defect and system therefor'20097,535,562'Apparatus and method for defect inspection'20097,487,049'Surface inspection method and surface inspection apparatus'20097,457,455'Pattern defect inspection method and apparatus'20087,456,948'Method for detecting particles and defects and inspection equipment thereof'20087,417,720'Lighting optical machine and defect inspection system'20087,305,314'Method for inspecting defect and system therefor'20077,133,127'Lighting optical machine and defect inspection system'20067,010,447'Method for inspecting defect and system therefor'20066,792,359'Method for inspecting defect and system therefor'20046,683,683'Defect inspection method and apparatus for silicon wafer'20046,421,308'State detecting device and optical disk device'20026,384,909'Defect inspection method and apparatus for silicon wafer'20026,331,967'Disk-rotation control apparatus'20016,275,878'Data recorder and data producing circuit'20016,259,662'Disk rotation control device'20016,256,092'Defect inspection apparatus for silicon wafer'20016,226,079'Defect assessing apparatus and method, and semiconductor manufacturing method'20016,191,849'Wafer inspecting apparatus'20016,160,615'Surface measurement apparatus for detecting crystal defects of wafer'20006,157,444'Defect inspection apparatus for silicon wafer'20006,118,742'Disk-rotation control apparatus'20006,108,079'Method for measuring crystal defect and equipment using the same'20005,892,581'Absorptivity detecting apparatus, chromatographic apparatus, method of detecting absorptivity and method of chromatography'19995,557,404'Spectrophotometer with a system for calibrating a monochromator'19965,253,183'Obtaining a spectrogram from a single scanning of interference fringes'1993D0337334'High speed electroforming system'19935,179,733'Wristwatch band with radio antenna'19935,152,693'Clasp to join straps containing an antenna for a portable information device'19924,939,463'Image reconstruction method in NMR imaging'19904,797,616'High speed NMR spectroscopic imaging method'19894,777,443'Inspection apparatus based on nuclear magnetic resonance'19884,757,168'Decorative improved switching apparatus having a rocking element'19884,752,735'Method for measuring the time dependence of the field gradient in an NMR imaging device'19884,732,481'Polarization interferometer'19884,733,188'NMR imaging method'19884,727,325'NMR imaging method'19884,716,369'High speed imaging method with three-dimensional NMR'19874,689,568'NMR chemical shift imaging method'19874,683,433'Imaging method and apparatus using nuclear magnetic resonance'19874,672,318'Method of measuring the static magnetic field distribution in an NMR inspection system'19874,625,170'NMR imaging method and apparatus'19864,117,658'Waterproof watch case'19784,079,651'Touch response sensor for an electronic musical instrument'19784,052,581'Switch with movable and fixed contacts'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–1992Based in Suwa, JP· patent location history
1986–2009Patents assigned to HITACHI LTD (27)· patent assignee history
1986–1988Based in Koganei, JP· patent location history
1988–2018Based in Tokyo, JP· patent location history
1988–1993Based in Katsuta, JP· patent location history
1996–2015Based in Hitachinaka, JP· patent location history
2000–2002Patents assigned to MITSUBISHI ELECTRIC CORP (5)· patent assignee history
2006–2018Patents assigned to HITACHI HIGH TECH CORP (47)· patent assignee history
2012–2016Patents assigned to MATSUI SHIGERU (15)· patent assignee history
2013–2015Patents assigned to NAKAO TOSHIYUKI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI HIGH TECH CORP472006–2018
HITACHI LTD271986–2009
MATSUI SHIGERUself152012–2016
MITSUBISHI ELECTRIC CORP52000–2002
NAKAO TOSHIYUKI22013–2015
Locations
LocationPatentsSpan
Hitachinaka, JP571996–2015
Tokyo, JP111988–2018
Koganei, JP91986–1988
Katsuta, JP21988–1993
Suwa, JP21978–1992