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Inventor

Adrianus Johannes Henricus Maas

Inventor
Eindhoven, NL

Overview

2→
Patents
2008–2010
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
B08BCleaning in general25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
7,728,956'Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data'20107,315,346'Lithographic apparatus and device manufacturing method'2008

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008–2010Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2008–2010Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22008–2010
Locations
LocationPatentsSpan
Eindhoven, NL22008–2010