Inventor
Georgiy O. Vaschenko
Inventor
San Diego, CA, US
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Gprimary
H05GX-ray technique28%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
Y10TTechnical subjects covered by former us classification7%
H05HPlasma technique6%
B82YSpecific uses or applications of nanostructures4%
G21KHandling of particles or ionising radiation not otherwise provided for4%
H01JElectric discharge tubes or discharge lamps4%
A61NElectrotherapy3%
B01DSeparation3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
PatentTitleYear
10,904,994Supply system for an extreme ultraviolet light source202110,632,505System method and apparatus for high pressure liquid jet cleaning of sintered filters202010,499,485Supply system for an extreme ultraviolet light source201910,481,498Droplet generator for lithographic apparatus, EUV source and lithographic apparatus201910,455,680Method and apparatus for purifying target material for EUV light source20199,699,876'Method of and apparatus for supply and recovery of target material'20179,632,418'Target material supply apparatus for an extreme ultraviolet light source'20179,392,678'Target material supply apparatus for an extreme ultraviolet light source'20169,029,813'Filter for material supply apparatus of an extreme ultraviolet light source'20158,969,840'Droplet generator with actuator induced nozzle cleaning'20158,969,839'Laser produced plasma EUV light source'20158,969,838'Systems and methods for protecting an EUV light source chamber from high pressure source material leaks'20158,829,477'Droplet generator with actuator induced nozzle cleaning'20148,748,854'Laser produced plasma EUV light source'20148,530,871'Laser produced plasma EUV light source'20138,513,629'Droplet generator with actuator induced nozzle cleaning'20138,319,201'Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave'20128,158,960'Laser produced plasma EUV light source'20128,138,487'System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber'20127,931,850'Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light'20117,897,947'Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave'20117,872,245'Systems and methods for target material delivery in a laser produced plasma EUV light source'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2012Patents assigned to CYMER INC (5)· patent assignee history
2011–2021Based in San Diego, CA, US· patent location history
2012–2015Patents assigned to VASCHENKO GEORGIY O (8)· patent assignee history
2012Patents assigned to ERSHOV ALEXANDER I (2)· patent assignee history
2013–2014Patents assigned to Cymer LLC (3)· patent assignee history
2014–2021Patents assigned to ASML NETHERLANDS BV (14)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 14 | 2014–2021 |
| VASCHENKO GEORGIY Oself | 8 | 2012–2015 |
| CYMER INC | 5 | 2011–2012 |
| Cymer LLC | 3 | 2013–2014 |
| ERSHOV ALEXANDER I | 2 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Diego, California, US | 22 | 2011–2021 |