Inventor
XINHAI HAN
Inventor
US
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices18%
C23CCoating metallic material15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H01JElectric discharge tubes or discharge lamps13%
H10BElectronic memory devices12%
H10DInorganic electric semiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
G01BMeasuring length, thickness or similar linear dimensions2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
PatentTitleYear
12,566,412Deposition thickness drift compensation in substrate processing systems202612,317,493Methods of forming 3D NAND structures with decreased pitch202512,265,379Methods and mechanisms for adjusting film deposition parameters during substrate manufacturing202512,195,846Modified stacks for 3D NAND202512,110,590Faceplate having a curved surface202411,948,846Analyzing in-plane distortion202411,946,140Hot showerhead202411,898,249PECVD process202411,851,759Faceplate having a curved surface202311,837,448High-temperature chamber and chamber component cleaning and maintenance method and apparatus202311,776,835Power supply signal conditioning for an electrostatic chuck202311,637,043Analyzing in-plane distortion202311,622,4893-D NAND control gate enhancement202311,613,812PECVD process202311,569,257Multi-layer stacks for 3D NAND extendability202311,538,677Systems and methods for depositing high density and high tensile stress films202211,530,482Faceplate having a curved surface202211,515,3243D NAND structures with decreased pitch202211,501,993Semiconductor substrate supports with improved high temperature chucking202211,365,476Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices202211,339,475Film stack overlay improvement202211,276,569On stack overlay improvement for 3D NAND202211,164,8823-D NAND control gate enhancement202111,145,504Method of forming film stacks with reduced defects2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to APPLIED MATERIALS INC (24)· patent assignee history
2021–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 24 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 24 | 2021–2026 |