Inventor
Vlad Temchenko
Inventor
Dresden, DE
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G11CStatic stores17%
H01LSemiconductor devices17%
H10BElectronic memory devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
10,991,700Methods of forming semiconductor devices using aspect ratio dependent etching effects, and related memory devices and electronic systems202110,593,678Methods of forming semiconductor devices using aspect ratio dependent etching effects, and related semiconductor devices20208,715,910'Method for exposing an area on a substrate to a beam and photolithographic system'20147,910,265'Reticle for use in a semiconductor lithographic system and method for modifying the same'20117,880,863'Lithography system with illumination monitor'20117,738,160'Optical components, illumination systems, and methods'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2014Patents assigned to INFINEON TECHNOLOGIES AG (4)· patent assignee history
2010–2014Based in Dresden, DE· patent location history
2014Patents assigned to LIM CHINTEONG (1)· patent assignee history
2014Patents assigned to RODY YVES FABIEN (1)· patent assignee history
2014Patents assigned to SCHNEIDER JENS (1)· patent assignee history
2020–2021Patents assigned to MICRON TECHNOLOGY INC (2)· patent assignee history
2020–2021Based in Boise, ID, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INFINEON TECHNOLOGIES AG | 4 | 2010–2014 |
| MICRON TECHNOLOGY INC | 2 | 2020–2021 |
| LIM CHINTEONG | 1 | 2014 |
| RODY YVES FABIEN | 1 | 2014 |
| SCHNEIDER JENS | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Dresden, DE | 4 | 2010–2014 |
| Boise, ID, US | 2 | 2020–2021 |