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Inventor

Naoko Kawai

Inventor
Kyoto, JP

Overview

2→
Patents
2015
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
B24BMachines, devices, or processes for grinding or polishing14%
C09GPolishing compositions14%
C09KMaterials for miscellaneous applications, not provided for elsewhere14%
PatentTitleYear
9,150,759'Chemical mechanical polishing composition for polishing silicon wafers and related methods'20158,980,749'Method for chemical mechanical polishing silicon wafers'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015Patents assigned to NITTA HAAS INC (2)· patent assignee history
2015Patents assigned to ROHM & HAAS ELECT MAT (2)· patent assignee history
2015Based in Kyoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NITTA HAAS INC22015
ROHM & HAAS ELECT MAT22015
Locations
LocationPatentsSpan
Kyoto, JP22015