Inventor

KARTIK RAMASWAMY

Inventor

US

Overview

2022–2026

Patent span

Electricity

Primary field (CPC H)

Patents· 76 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps37%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%

H01LSemiconductor devices17%

C23CCoating metallic material8%

H03HImpedance networks, e.g. resonant circuits4%

G01RMeasuring electric variables2%

H03KPulse technique2%

H05HPlasma technique2%

G02BOptical elements, systems or apparatus1%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%

PatentTitleYear

12,586,761Fast tuning radio frequency (RF) matching network2026 12,580,155Learning based tuning in a radio frequency plasma processing chamber2026 12,573,588Plasma processing system configured to deliver a pulsed voltage waveform2026 12,567,561High-power density RF remote plasma source apparatus2026 12,567,539Methods for forming a high current inductor and non-transitory computer readable medium2026 12,562,353Replaceable electrostatic chuck outer ring for edge arcing mitigation2026 12,555,748Symmetric plasma process chamber2026 12,525,433Method and apparatus to reduce feature charging in plasma processing chamber2026 12,505,982Method and apparatus for digital control of ion energy distribution in a plasma2025 12,486,577Pulsed plasma (DC/RF) deposition of high quality C films for patterning2025 12,482,652Method for forming integrated circuit structures2025 12,476,081Methods and apparatus for processing a substrate2025 12,469,680Radio-frequency (RF) matching network for fast impedance tuning2025 12,469,733Wafer to baseplate arc prevention using textured dielectric2025 12,463,011Inductively coupled plasma source with radial coil network2025 12,456,607Auxiliary plasma source for robust ignition and restrikes in a plasma chamber2025 12,400,845Ion energy control on electrodes in a plasma reactor2025 12,368,020Pulsed voltage source for plasma processing applications2025 12,347,647Plasma excitation with ion energy control2025 12,334,304System and methods for implementing a micro pulsing scheme using dual independent pulsers2025 12,334,383Substrate support gap pumping to prevent glow discharge and light-up2025 12,293,897Radio frequency diverter assembly enabling on-demand different spatial2025 12,278,089Plasma uniformity control system and methods2025 12,272,524Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics2025 12,266,506Scanning impedance measurement in a radio frequency plasma processing chamber2025 12,261,019Voltage pulse time-domain multiplexing2025 12,237,148Plasma processing assembly using pulsed-voltage and radio-frequency power2025 12,224,192Bowed substrate clamping method, apparatus, and system2025 12,205,797Solid-state switch based high-speed pulser with plasma IEDF modification capability through multilevel output functionality2025 12,183,605In-situ semiconductor processing chamber temperature apparatus2024 12,163,218Continuous liner for use in a processing chamber2024 12,136,537Cost effective radio frequency impedance matching networks2024 12,130,561Gas distribution plate with UV blocker2024 12,125,689Methods and apparatus for toroidal plasma generation2024 12,111,341In-situ electric field detection method and apparatus2024 12,106,938Distortion current mitigation in a radio frequency plasma processing chamber2024 12,094,716Chambers and coatings for reducing backside damage2024 12,080,519Smart dynamic load simulator for RF power delivery control system2024 12,046,449Methods and apparatus for processing a substrate2024 12,020,901RF impedance matching networks for substrate processing platform2024 11,972,924Pulsed voltage source for plasma processing applications2024 11,967,483Plasma excitation with ion energy control2024 11,948,826High power electrostatic chuck design with radio frequency coupling2024 11,935,724Symmetric VHF source for a plasma reactor2024 11,915,850Two channel cosine-theta coil assembly2024 11,894,255Sheath and temperature control of process kit2024 11,848,176Plasma processing using pulsed-voltage and radio-frequency power2023 11,823,868Hardware switch on main feed line in a radio frequency plasma processing chamber2023 11,814,724Continuous liner for use in a processing chamber2023 11,810,760Apparatus and method of ion current compensation2023 11,784,042Carbon hard masks for patterning applications and methods related thereto2023 11,776,788Pulsed voltage boost for substrate processing2023 11,776,789Plasma processing assembly using pulsed-voltage and radio-frequency power2023 11,749,505Methods and apparatus for processing a substrate2023 11,735,486Process monitor device having a plurality of sensors arranged in concentric circles2023 11,721,525Sensorless RF impedance matching network2023 11,651,966Methods and apparatus for processing a substrate2023 11,603,591Pulsed plasma (DC/RF) deposition of high quality C films for patterning2023 11,587,766Symmetric VHF source for a plasma reactor2023 11,538,663Methods and apparatus for processing a substrate2022 11,532,497High power electrostatic chuck design with radio frequency coupling2022 11,499,223Continuous liner for use in a processing chamber2022 11,488,852Methods and apparatus for reducing high voltage arcing in semiconductor process chambers2022 11,476,090Voltage pulse time-domain multiplexing2022 11,469,097Carbon hard masks for patterning applications and methods related thereto2022 11,462,389Pulsed-voltage hardware assembly for use in a plasma processing system2022 11,462,386Electron beam apparatus for optical device fabrication2022 11,462,388Plasma processing assembly using pulsed-voltage and radio-frequency power2022 11,446,740Multiple sequential linear powder dispensers for additive manufacturing2022 11,448,977Gas distribution plate with UV blocker at the center2022 11,447,868Method for controlling a plasma process2022 11,430,634Methods of optical device fabrication using an electron beam apparatus2022 11,424,096Temperature controlled secondary electrode for ion control at substrate edge2022 11,424,104Plasma reactor with electrode filaments extending from ceiling2022 11,355,321Plasma reactor with electrode assembly for moving substrate2022 11,315,760Symmetric plasma process chamber2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2026Patents assigned to APPLIED MATERIALS INC (76)· patent assignee history

2022–2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
APPLIED MATERIALS INC	76	2022–2026

Locations

Location	Patents	Span
US	76	2022–2026