Inventor
Takayuki Kamaishi
Inventor
Nirasaki, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1042%
C23CCoating metallic material17%
H01JElectric discharge tubes or discharge lamps17%
H01LSemiconductor devices17%
H10DInorganic electric semiconductor devices8%
PatentTitleYear
10,950,417Substrate processing apparatus and substrate loading mechanism20219,984,892Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming system20188,191,505'Process gas introducing mechanism and plasma processing device'20127,769,279'Heat treatment apparatus'20107,250,094'Heat treatment apparatus'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2021Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
2007–2021Based in Nirasaki, JP· patent location history
2012Patents assigned to KAMAISHI TAKAYUKI (1)· patent assignee history
2012Patents assigned to MORISHIMA MASATO (1)· patent assignee history
2012Patents assigned to SHIMAMURA AKINORI (1)· patent assignee history
2018Based in Yamanashi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 5 | 2007–2021 |
| KAMAISHI TAKAYUKIself | 1 | 2012 |
| MORISHIMA MASATO | 1 | 2012 |
| SHIMAMURA AKINORI | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 4 | 2007–2021 |
| Yamanashi, JP | 1 | 2018 |