Inventor
Todd C. Bailey
Inventor
Fishkill, NY, US
Overview
Patents· 33 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
B82YSpecific uses or applications of nanostructures13%
B29CShaping or joining of plastics12%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
Y10TTechnical subjects covered by former us classification11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G06FElectric digital data processing5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units4%
G11BInformation storage based on relative movement between record carrier and transducer4%
PatentTitleYear
11,090,648Multi-stage oral-fluid testing device202110,210,292Process-metrology reproducibility bands for lithographic photomasks20199,928,316'Process-metrology reproducibility bands for lithographic photomasks'20189,223,202'Method of automatic fluid dispensing for imprint lithography processes'20158,514,374'Alignment method for semiconductor processing'20138,491,984'Structure resulting from chemical shrink process over BARC (bottom anti-reflective coating)'20138,495,527'Pattern recognition with edge correction for design based metrology'20138,429,570'Pattern recognition with edge correction for design based metrology'20138,415,212'Method of enhancing photoresist adhesion to rare earth oxides'20138,359,562'System and method for semiconductor device fabrication using modeling'20138,330,937'Stray light feedback for dose control in semiconductor lithography systems'20128,110,496'Method for performing chemical shrink process over BARC (bottom anti-reflective coating)'20128,033,814'Device for holding a template for use in imprint lithography'20117,998,871'Mask forming and implanting methods using implant stopping layer'20117,926,006'Variable fill and cheese for mitigation of BEOL topography'20117,708,542'Device for holding a template for use in imprint lithography'20107,651,947'Mask forming and implanting methods using implant stopping layer and mask so formed'20107,583,362'Stray light feedback for dose control in semiconductor lithography systems'20097,514,356'Ribs for line collapse prevention in damascene structures'20097,303,383'Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks'20077,288,478'Method for performing chemical shrink process over BARC (bottom anti-reflective coating)'20077,229,273'Imprint lithography template having a feature size under 250 nm'20077,186,483'Method of determining alignment of a template and a substrate having a liquid disposed therebetween'20077,083,898'Method for performing chemical shrink process over BARC (bottom anti-reflective coating)'20067,060,324'Method of creating a dispersion of a liquid on a substrate'20066,986,975'Method of aligning a template with a substrate employing moire patterns'20066,954,275'Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography'20056,921,615'High-resolution overlay alignment methods for imprint lithography'20056,919,152'High resolution overlay alignment systems for imprint lithography'20056,916,585'Method of varying template dimensions to achieve alignment during imprint lithography'20056,902,853'Dual wavelength method of determining a relative position of a substrate and a template'20056,842,229'Imprint lithography template comprising alignment marks'20056,696,220'Template for room temperature, low pressure micro-and nano-imprint lithography'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2015Patents assigned to UNIV TEXAS (14)· patent assignee history
2004–2005Based in Austin, TX, US· patent location history
2005–2015Based in Fishkill, NY, US· patent location history
2006–2019Patents assigned to IBM (15)· patent assignee history
2009–2013Patents assigned to INFINEON TECHNOLOGIES AG (4)· patent assignee history
2010–2019Based in Poughkeepsie, NY, US· patent location history
2012–2015Patents assigned to BAILEY TODD C (7)· patent assignee history
2012–2013Patents assigned to BAILEY TODD CHRISTOPHER (2)· patent assignee history
2013Based in Hopewell Junction, NY, US· patent location history
2021Based in Shorewood, MN, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 15 | 2006–2019 |
| UNIV TEXAS | 14 | 2004–2015 |
| BAILEY TODD Cself | 7 | 2012–2015 |
| INFINEON TECHNOLOGIES AG | 4 | 2009–2013 |
| BAILEY TODD CHRISTOPHERself | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fishkill, New York, US | 17 | 2005–2015 |
| Poughkeepsie, New York, US | 9 | 2010–2019 |
| Austin, Texas, US | 5 | 2004–2005 |
| Shorewood, Minnesota, US | 1 | 2021 |
| Hopewell Junction, New York, US | 1 | 2013 |