Inventor
Osamu Miyahara
Inventor
Koshi, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C22CAlloys10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
C21DModifying the physical structure of ferrous metals7%
C22FChanging the physical structure of non-ferrous metals and non-ferrous alloys7%
C23CCoating metallic material7%
G21DNuclear power plant6%
Y10TTechnical subjects covered by former us classification6%
F22BMethods of steam generation4%
G11BInformation storage based on relative movement between record carrier and transducer4%
PatentTitleYear
10,818,521Substrate processing apparatus, substrate processing method, and storage medium2020D0843118Cleaning brush201910,106,871Ni-based alloy tube20189,745,642'Method for heat treating a metal tube or pipe, metal tube or pipe, and heat treatment furnace'20179,695,486'Cr-containing austenitic alloy and method for producing the same'20179,493,860'Chromium-containing austenitic alloy'20169,381,555'Method of cold rolling a seamless pipe'20168,703,400'Substrate treatment method, coating treatment apparatus, and substrate treatment system'20148,398,320'Non-transitory storage medium for rinsing or developing sequence'20138,366,872'Substrate treatment method, coating film removing apparatus, and substrate treatment system'20138,313,591'Austenitic heat resistant alloy'20128,293,169'Ni-base heat resistant alloy'20128,083,959'Substrate processing method, substrate processing system, and computer-readable storage medium'20118,054,443'Developing method and developing apparatus'20117,968,278'Rinse treatment method and development process method'20117,959,988'Coating film forming apparatus and method'20117,926,441'Substrate treatment method, coating treatment apparatus, and substrate treatment system'20117,857,680'Method for producing glass substrate for magnetic disk, and magnetic disk'20107,691,207'Method for cleaning disk-shape glass substrate and magnetic disk'20107,618,895'Method for etching doughnut-type glass substrates'20097,618,723'Glass substrate for magnetic disk, its production method and magnetic disk'20097,486,377'Developing method and developing apparatus'20097,037,390'Method of heat treatment for Ni-base alloy tube'20066,482,528'Nickel-base alloy product and method of producing the same'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2012Patents assigned to SUMITOMO METAL IND (4)· patent assignee history
2009–2020Patents assigned to TOKYO ELECTRON LTD (11)· patent assignee history
2009–2010Patents assigned to ASAHI GLASS CO LTD (4)· patent assignee history
2009–2014Based in Koshi, JP· patent location history
2009–2010Based in Chiyoda-ku, JP· patent location history
2009–2010Based in Yokohama, JP· patent location history
2011–2014Patents assigned to MIYAHARA OSAMU (6)· patent assignee history
2016–2018Patents assigned to NIPPON STEEL & SUMITOMO METAL CORP (5)· patent assignee history
2016–2018Based in Tokyo, JP· patent location history
2019–2020Based in Kumamoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 11 | 2009–2020 |
| MIYAHARA OSAMUself | 6 | 2011–2014 |
| NIPPON STEEL & SUMITOMO METAL CORP | 5 | 2016–2018 |
| ASAHI GLASS CO LTD | 4 | 2009–2010 |
| SUMITOMO METAL IND | 4 | 2002–2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 9 | 2009–2014 |
| Tokyo, JP | 5 | 2016–2018 |
| Kumamoto, JP | 2 | 2019–2020 |
| Chiyoda-ku, JP | 2 | 2009–2010 |
| Yokohama, JP | 2 | 2009–2010 |