Inventor
MARCO JAN-JACO WIELAND
Inventor
NL
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps44%
H01LSemiconductor devices8%
B82YSpecific uses or applications of nanostructures6%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
G21KHandling of particles or ionising radiation not otherwise provided for6%
H10DInorganic electric semiconductor devices6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G06FElectric digital data processing3%
G11CStatic stores3%
PatentTitleYear
12,548,735Charged particle assessment tool, inspection method202612,537,158Charged particle assessment tool, inspection method202612,505,978—202512,476,069Charged particle assessment tool, inspection method202512,422,387Charged particle optical device, objective lens assembly, detector, detector array, and methods202512,387,903Aberration correction in charged particle system202512,381,062Tool for testing an electron-optical assembly202512,125,671Multi-source charged particle illumination apparatus202411,984,295Charged particle assessment tool, inspection method202411,961,627Vacuum chamber arrangement for charged particle beam generator202411,821,859Charged particle optical device, objective lens assembly, detector, detector array, and methods2023RE049725Method and arrangement for handling and processing substrates202311,798,783Charged particle assessment tool, inspection method2023RE049602Lithography system, sensor and measuring method202311,705,252Vacuum chamber arrangement for charged particle beam generator202311,501,952Memory device with predetermined start-up value202211,348,756Aberration correction in charged particle system202211,152,302Fabricating unique chips using a charged particle multi-beamlet lithography system2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to ASML NETHERLANDS BV (18)· patent assignee history
2021–2026Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 18 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 18 | 2021–2026 |