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Inventor

Hongging Shan

Inventor
Cupertino, CA, US

Overview

2→
Patents
1994–2002
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
C23CCoating metallic material25%
H01JElectric discharge tubes or discharge lamps25%
PatentTitleYear
6,364,957'Support assembly with thermal expansion compensation'20025,296,094'Process for etching silicon dioxide layer without micro masking effect'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994Patents assigned to INTEL CORP (1)· patent assignee history
1994Based in San Jose, CA, US· patent location history
2002Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
2002Based in Cupertino, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC12002
INTEL CORP11994
Locations
LocationPatentsSpan
Cupertino, California, US12002
San Jose, California, US11994