Inventor
MICHAEL BUDACH
Inventor
DE
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
H01JElectric discharge tubes or discharge lamps22%
B08BCleaning in general9%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
G01QScanning-probe techniques or apparatus9%
G01BMeasuring length, thickness or similar linear dimensions6%
G02BOptical elements, systems or apparatus3%
G05BControl or regulating systems in general3%
G06TImage data processing or generation, in general3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
12,493,238Method, device and computer program for repairing a mask defect202512,292,680Method and apparatuses for disposing of excess material of a photolithographic mask202512,164,226Method and apparatuses for disposing of excess material of a photolithographic mask202412,135,540Devices and methods for examining and/or processing an element for photolithography202411,874,598Method and apparatuses for disposing of excess material of a photolithographic mask202411,733,186Device and method for analyzing a defect of a photolithographic mask or of a wafer202311,650,495Apparatus and method for determining a position of an element on a photolithographic mask202311,592,461Apparatus and method for examining and/or processing a sample202311,385,540Apparatus and method for determining a position of an element on a photolithographic mask202211,262,378Apparatus and method for examining and/or processing a sample202211,256,168Apparatus and method for repairing a photolithographic mask202211,150,552Method and apparatus for analyzing a defective location of a photolithographic mask2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ZEISS CARL SMT GMBH (12)· patent assignee history
2021–2025Based in DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 12 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| DE | 12 | 2021–2025 |