Inventor
Hiroaki Oizumi
Inventor
Kokubunji, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices48%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests19%
G21KHandling of particles or ionising radiation not otherwise provided for10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
B82YSpecific uses or applications of nanostructures5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
H05KPrinted circuits5%
PatentTitleYear
9,291,919'Light exposure method, and light exposure apparatus'20166,613,497'Light exposure method'20035,485,497'Optical element and projection exposure apparatus employing the same'19965,372,916'X-ray exposure method with an X-ray mask comprising phase shifter sidewalls'19945,305,364'Projection type X-ray lithography apparatus'19945,272,744'Reflection mask'19935,177,773'X-ray mask and method for producing same'19935,017,458'Method for production of graft copolymer, pattern replication method, and base polymer and resist for graft copolymerization'19914,960,676'Method for forming pattern by using graft copolymerization'19904,954,424'Pattern fabrication by radiation-induced graft copolymerization'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1990–1996Patents assigned to HITACHI LTD (8)· patent assignee history
1990–1996Based in Kokubunji, JP· patent location history
2003Patents assigned to SONY CORP (1)· patent assignee history
2003Based in Tokyo, JP· patent location history
2016Patents assigned to OIZUMI HIROAKI (1)· patent assignee history
2016Patents assigned to RENESAS ELECTRONICS CORP (1)· patent assignee history
2016Based in Tachikawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 8 | 1990–1996 |
| OIZUMI HIROAKIself | 1 | 2016 |
| RENESAS ELECTRONICS CORP | 1 | 2016 |
| SONY CORP | 1 | 2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kokubunji, JP | 8 | 1990–1996 |
| Tachikawa, JP | 1 | 2016 |
| Tokyo, JP | 1 | 2003 |