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Inventor

Ryo Tajima

Inventor
Tokyo, JP

Overview

14→
Patents
2006–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G01NInvestigating or analysing materials by determining their chemical or physical properties15%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1015%
H01LSemiconductor devices7%
D05CEmbroidering5%
D05BSewing2%
D05DIndexing scheme associated with subclasses d05b and d05c, relating to sewing, embroidering and tufting2%
H04JMultiplex communication2%
H04LTransmission of digital information, e.g. telegraphic communication2%
PatentTitleYear
10,707,048Deflection sensitivity calculation method and deflection sensitivity calculation system202010,446,404Electron-beam irradiated area adjustment method and adjustment system, electron-beam irradiated region correction method, and electron beam irradiation apparatus201910,002,740Inspection device20189,852,878Surface processing apparatus20179,406,480'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20169,105,445'Inspection system, inspection image data generation method, inspection display unit, defect determination method, and storage medium on which inspection display program is recorded'20158,946,631'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20158,742,341'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20148,256,362'Embroidery sewing machine and control method therefor'20128,013,315'Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same'20117,934,461'Sewing machine capable of sewing sequins and method for setting sequin feed amount therefor'20117,741,601'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20107,365,324'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'20087,138,629'Testing apparatus using charged particles and device manufacturing method using the testing apparatus'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2020Patents assigned to EBARA CORP (12)· patent assignee history
2006–2016Based in Kanagawa, JP· patent location history
2008Based in Yokohama, JP· patent location history
2011–2012Patents assigned to TOKAI IND SEWING MACHINE (2)· patent assignee history
2011–2012Based in Nagoya, JP· patent location history
2011Based in Fujisawa, JP· patent location history
2012–2014Patents assigned to TAJIMA RYO (2)· patent assignee history
2014Patents assigned to HATAKEYAMA MASAHIRO (1)· patent assignee history
2014Patents assigned to KARIMATA TSUTOMU (1)· patent assignee history
2015–2020Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP122006–2020
TAJIMA RYOself22012–2014
TOKAI IND SEWING MACHINE22011–2012
HATAKEYAMA MASAHIRO12014
KARIMATA TSUTOMU12014
Locations
LocationPatentsSpan
Tokyo, JP52015–2020
Kanagawa, JP52006–2016
Nagoya, JP22011–2012
Fujisawa, JP12011
Yokohama, JP12008