Inventor
Itaru Yanagi
Inventor
Tokyo, JP
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms13%
H10DInorganic electric semiconductor devices13%
G11CStatic stores7%
H10BElectronic memory devices7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
H01LSemiconductor devices5%
B01LChemical or physical laboratory apparatus for general use4%
B81BMicrostructural devices or systems, e.g. micromechanical devices4%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems4%
PatentTitleYear
10,969,377Biopolymer analysis device and biopolymer analysis method202110,908,121Membrane device, measurement device, and method for producing membrane device202110,761,057Membrane device and method for manufacturing same202010,753,922Biomolecule measurement apparatus202010,724,147Hole forming method, measuring apparatus and chip set202010,712,332Solution tank device202010,416,147Method of manufacturing membrane device, membrane device, and nanopore device201910,338,057Device and method for forming same201910,294,525Biomolecule measurement system and biomolecule measurement method201910,030,266Semiconductor device and manufacturing method thereof20189,759,681'Biomolecule detection method, biomolecule detection device and analysis device'20179,673,339'Semiconductor storage device and manufacturing method thereof'20178,816,426'Semiconductor storage device and manufacturing method thereof'20148,410,543'Semiconductor storage device and manufacturing method thereof'20138,319,274'Semiconductor device'20127,863,134'Nonvolatile semiconductor storage device and manufacturing method thereof'20117,719,051'Nonvolatile semiconductor storage device and manufacturing method thereof'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2017Based in Kunitachi, JP· patent location history
2011–2017Patents assigned to RENESAS ELECTRONICS CORP (5)· patent assignee history
2012–2013Patents assigned to HISAMOTO DIGH (2)· patent assignee history
2012–2013Patents assigned to MINE TOSHIYUKI (2)· patent assignee history
2017–2020Patents assigned to HITACHI HIGH TECH CORP (3)· patent assignee history
2017–2021Based in Tokyo, JP· patent location history
2018–2021Patents assigned to HITACHI LTD (8)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 8 | 2018–2021 |
| RENESAS ELECTRONICS CORP | 5 | 2011–2017 |
| HITACHI HIGH TECH CORP | 3 | 2017–2020 |
| HISAMOTO DIGH | 2 | 2012–2013 |
| MINE TOSHIYUKI | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 11 | 2017–2021 |
| Kunitachi, JP | 6 | 2010–2017 |