Inventor

Yoshinobu Nakamura

Inventor

Toyama, JP

Overview

1988–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 86 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%

C23CCoating metallic material10%

H01LSemiconductor devices10%

H02KDynamo-electric machines4%

A63BApparatus for physical training, gymnastics, swimming, climbing, or fencing3%

B29CShaping or joining of plastics3%

B29LIndexing scheme associated with subclass b29c, relating to particular articles3%

G06FElectric digital data processing3%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

H05KPrinted circuits3%

PatentTitleYear

10,871,331Cooling device and motor utilizing a heating element to circulate cooling2020 10,819,190Motor2020 10,800,121Tire vulcanization method, tire production method and tire2020 10,640,869Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium2020 10,558,097Active matrix substrate and demultiplexer circuit2020 10,497,561Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium2019 10,483,822Motor2019 10,421,242Device for bonding rubber strip2019 10,305,345Motor2019 10,229,829Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium2019 10,185,901Image processing apparatus and non-transitory computer readable medium with variable image density2019 10,163,625Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium2018 10,121,654Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium2018 10,068,163Image processing apparatus and non-transitory computer readable medium using difference in processing speed information2018 10,030,179Granular adhesive agent2018 10,016,915Rubber strip manufacturing apparatus2018 9,929,620'Motor'2018 9,895,727'Method of manufacturing semiconductor device, method of cleaning interior of process chamber, substrate processing apparatus, and recording medium'2018 9,837,262Method of manufacturing a SiOCN film, substrate processing apparatus and recording medium2017 9,762,112'Actuator and method of manufacturing actuator'2017 9,691,606'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'2017 9,685,844'Motor and method of manufacturing motor'2017 9,575,698'Printer control device and non-transitory computer readable medium'2017 9,455,137'Method of manufacturing semiconductor device'2016 9,431,236'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'2016 9,412,585'Method of manufacturing a SiOCN film, substrate processing apparatus, and recording medium'2016 9,409,338'Apparatus and method for manufacturing raw rubber strip'2016 9,390,911'Method of manufacturing semiconductor device'2016 9,378,943'Method of manufacturing semiconductor device, method of processing substrate substrate processing apparatus and non-transitory computer-readable recording medium'2016 9,263,253'Method of manufacturing a SiOCN film, substrate processing apparatus, and recording medium'2016 9,218,955'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'2015 9,136,114'Method of manufacturing semiconductor device, substrate processing method, computer-readable medium with program for executing a substrate processing method, and substrate processing apparatus'2015 9,134,438'Radiation detecting element using oxide crystal and method of manufacturing oxide crystal'2015 8,951,919'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'2015 8,946,092'Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus'2015 8,728,954'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'2014 8,634,107'Print data processing system, print data processing method, and non-transitory computer readable medium'2014 8,546,272'Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus'2013 8,253,950'Recording material moving device to position a record material within a movable range of a predetermined width and image forming device'2012 8,068,194'Line light source device, plane light emission device, plane light source device, and liquid crystal display'2011 7,880,871'Recording sheet moving device, image forming device, and recording sheet moving method'2011 7,770,879'Recording medium transport apparatus and image forming apparatus'2010 7,709,922'Thermistor device'2010 7,506,548'Pressure sensor package structure'2009 7,462,918'Pressure sensor having gold-silicon eutectic crystal layer interposed between contact layer and silicon substrate'2008 7,382,599'Capacitive pressure sensor'2008 7,345,867'Capacitive pressure sensor and method of manufacturing the same'2008 7,312,883'Image forming system with peripheral device and version upgrade process'2007 7,057,361'Inverter control device and electric vehicle thereof'2006 7,055,150'Printer firmware installation method, printer and printer system'2006 7,043,576'Peripheral unit management system, method and program recording medium therefor'2006 7,028,946'Expander roll'2006 6,954,926'Label address translating device'2005 6,828,655'Semiconductor film with low crystal defect and semiconductor device and display apparatus using the semiconductor film'2004 6,823,704'Apparatus and method of forming cylindrical work piece'2004 6,640,993'Wide-mouth container made of synthetic resin and method of manufacturing pressure wide-mouth container'2003 6,629,623'Wide-mouth container made of synthetic resin and method of manufacturing pressure wide-mouth container'2003 6,586,376'Heat resistant lubricating oil composition'2003 6,511,437'Head blood flow balance inspecting apparatus'2003 6,422,414'Wide-mouth container made of synthetic resin and method of manufacturing pressure wide-mouth container'2002 6,391,087'Copper fine powder and method for preparing the same'2002 6,376,276'Method of preparing diamond semiconductor'2002 6,191,080'Heat resistant lubricating oil composition'2001 6,174,344'Copper fine powder and method for preparing the same'2001 6,061,247'Motor with attached control device'2000 5,745,492'Speech information freeze-out control method and equipment in mobile satellite communication system'1998 5,724,980'Pulse diagnosis meter'1998 5,644,171'Starter having an elastic seal member shaped to taper in a direction perpendicular to the longitudinal axis of the motor'1997 5,626,324'Non-sliding vacuum gate valve'1997 5,313,131'Slotless motor'1994 5,225,258'Rubber composition for hollow core of pressureless tennis ball'1993 5,209,471'Pressureless tennis ball'1993 5,206,575'Device for controlling an AC motor'1993 5,156,933'Method of manufacturing manganese dioxide'1992 5,068,150'Copper powder for electroconductive paints and electroconductive paint compositions'1991 5,068,151'Golf ball'1991 4,984,804'Golf ball'1991 4,946,166'Tennis ball'1990 4,929,678'Rubber composition and a solid golf ball obtained therefrom'1990 4,776,883'Process for the production of silver-palladium alloy fine powder'1988 4,756,478'Vibrating element for use on an ultrasonic injection nozzle'1988 4,757,454'Operation data-recording system for a machine'1988 4,746,325'Process for producing coal-water slurry at high concentration'1988 4,733,820'Vibrating element for use on an ultrasonic injection nozzle'1988 4,726,525'Vibrating element for ultrasonic injection'1988 4,726,523'Ultrasonic injection nozzle'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–2020Patents assigned to SUMITOMO RUBBER IND (13)· patent assignee history

1990–1993Based in Nishinomiya, JP· patent location history

1998–2009Based in Niigata, JP· patent location history

2006–2019Patents assigned to FUJI XEROX CO LTD (10)· patent assignee history

2011–2016Patents assigned to NAKAMURA YOSHINOBU (6)· patent assignee history

2013–2019Patents assigned to HITACHI INT ELECTRIC INC (17)· patent assignee history

2013–2020Based in Toyama, JP· patent location history

2016–2020Based in Kobe, JP· patent location history

2017–2020Patents assigned to NIDEC CORP (6)· patent assignee history

2017–2020Based in Kyoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI INT ELECTRIC INC	17	2013–2019
SUMITOMO RUBBER IND	13	1990–2020
FUJI XEROX CO LTD	10	2006–2019
NAKAMURA YOSHINOBUself	6	2011–2016
NIDEC CORP	6	2017–2020

Locations

Location	Patents	Span
Toyama, JP	20	2013–2020
Kyoto, JP	6	2017–2020
Niigata, JP	6	1998–2009
Nishinomiya, JP	5	1990–1993
Kobe, JP	4	2016–2020