Inventor

Yu Cao

Inventor
Beijing, CN

Overview

170→
Patents
2002–2021
Patent span
Physics
Primary field (CPC G)

Patents· 170 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G06Fprimary
G06FElectric digital data processing29%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
H04LTransmission of digital information, e.g. telegraphic communication11%
G06TImage data processing or generation, in general5%
H04WWireless communication networks4%
G16ZInformation and communication technology [ict] specially adapted for specific application fields, not otherwise provided for3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
PatentTitleYear
11,127,308Personalized digital therapeutic interventions202110,868,640HARQ systems and methods for grant-free uplink transmissions202010,869,333Systems and methods for mixed grant-free and grant-based uplink transmissions202010,862,786Method and device for fingerprint based status detection in a distributed processing system202010,860,245Method and apparatus for optimizing data storage based on application202010,861,306Method and apparatus for video surveillance202010,846,442Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration202010,847,858Method for manufacturing circulators with improved performance202010,839,131Three-dimensional mask model for photolithography simulation202010,833,822System and method for MA signature assignment based on UE group separation202010,833,811Systems and methods for user equipment cooperation with sidelink HARQ feedback202010,824,897Detecting an identity of a brand and/or an obfuscated identity of the brand within an image based on embeddings corresponding to regions of interest within the image202010,826,655HARQ systems and methods for grant-free uplink transmissions202010,813,124Systems and methods for mixed grant-free and grant-based uplink transmissions202010,803,322Networks of sensors collaboratively chronicling events of interest202010,805,350System and method for providing security services using a configuration template in a multi-tenant environment202010,795,266Method of performing model-based scanner tuning202010,789,234Method and apparatus for storing data202010,779,321Systems and methods for mixed grant-free and grant-based uplink transmissions202010,762,087Database search202010,755,120End-to-end lightweight method and apparatus for license plate recognition202010,747,812Video analytics202010,749,813Spatial-temporal cloud resource scheduling202010,736,064Efficient uplink timing synchronization for fixed-location M2m terminals202010,733,019Apparatus and method for data processing202010,705,981Method and apparatus for data storage service202010,708,344Continuous performance management in information processing systems202010,678,464Methods and apparatuses for data migration of a storage device202010,681,118Method and apparatus for distributed data processing202010,673,593HARQ signaling for grant-free uplink transmissions202010,651,980HARQ systems and methods for grant-free uplink transmissions202010,645,730Flexible grant-free resource configuration signaling202010,635,721Document recommendation202010,628,079Data caching for time-series analysis application202010,630,561System monitoring with metrics correlation for data center202010,592,633Fast freeform source and mask co-optimization method202010,595,336Systems and methods for grant-free uplink transmissions202010,569,469Model-based scanner tuning systems and methods202010,564,938Method and device of resource orchestration using an object-oriented language202010,545,790Method and system for processing data202010,536,355Monitoring and analytics system202010,534,671Container image layer compaction202010,498,814Network storage node and network storage system201910,491,498Method and device for fingerprint based status detection in a distributed processing system201910,484,950Method of power control for uplink transmission201910,469,585Data processing and data movement in cloud computing environment201910,469,574Incremental container state persistency and replication for containerized stateful applications201910,447,546Customized visualizations for data centers201910,448,454Self-organizing distributed task coordination for ad-hoc computing environment201910,423,075Methods and systems for pattern design with tailored response to wavefront aberration201910,404,533Systems and methods for configuring slot formats with multiple switching points per slot201910,402,733Adaptive ensemble workload prediction model based on machine learning algorithms201910,382,169HARQ systems and methods for grant-free uplink transmissions201910,372,525Method and device for determining causes of performance degradation for storage systems201910,324,643Automated initialization and configuration of virtual storage pools in software-defined storage201910,327,122System and method for machine-type communications201910,326,835Global data movement in cloud computing environment201910,310,371Method and system for lithography process-window-maximizing optical proximity correction201910,289,283Visual analysis for multi-dimensional data201910,291,706Container image distribution acceleration201910,237,149Application-level monitoring and profiling services in computing environments201910,229,105Mobile log data parsing201910,210,535Dynamically generating feedback based on contextual information201910,198,549Three-dimensional mask model for photolithography simulation201910,169,522Methods and system for model-based generic matching and tuning201910,164,898Method and apparatus for cloud system201810,137,643Model-based process simulation systems and methods201810,136,402Efficient uplink timing synchronization for fixed-location M2M terminals201810,126,560Spectrum-generation system based on multiple-diffraction optical phasometry201810,091,297Data processing and data movement in cloud computing environment201810,031,962Method and system for partitioning database201810,025,885Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration201810,025,198Smart selection and/or weighting of parameters for lithographic process simulation201810,025,519Data-driven online storage reconfiguration201810,020,915System and method for user equipment cooperation201810,007,733High-performance network data capture and storage201810,007,192Computational process control20189,953,127Fast freeform source and mask co-optimization method20189,921,485'Method of performing model-based scanner tuning'20189,923,785'Resource scaling in computing infrastructure'20189,785,645'Database migration management'20179,779,117'Database partitioning scheme evaluation and comparison'20179,779,186'Methods for performing model-based lithography guided layout design'20179,766,996'Learning-based data processing job performance modeling and prediction'20179,746,784'Lens heating compensation systems and methods'20179,693,172'System and method for machine-type communications'20179,672,301'Pattern selection for lithographic model calibration'20179,645,509'Scanner model representation with transmission cross coefficients'20179,619,603'Optimization of source, mask and projection optics'20179,591,683'System and method for adaptive cooperation mode selection strategies for wireless networks'20179,588,439'Information matrix creation and calibration test pattern selection based on computational lithography model parameters'20179,582,328'Allocation of resources in computing environments'20179,584,334'System and method for video multicasting'20179,459,537'System and method to ensure source and image stability'20169,390,206'Methods and systems for lithography process window simulation'20169,378,309'Pattern-independent and hybrid matching/tuning including light manipulation by projection optics'20169,372,957'Three-dimensional mask model for photolithography simulation'20169,360,766'Method and system for lithography process-window-maximixing optical proximity correction'20169,262,217'Computation resource cyclic utilization'20169,158,208'Method of performing model-based scanner tuning'20159,148,253'System and method for user equipment cooperation'20159,111,062'Fast freeform source and mask co-optimization method'20159,031,994'Database partitioning for data processing system'20159,009,647'Methods and systems for lithography calibration using a mathematical model for a lithographic process'20158,966,329'Fast parallel test of SRAM arrays'20158,942,463'Harmonic resist model for use in a lithographic apparatus and a device manufacturing method'20158,938,694'Three-dimensional mask model for photolithography simulation'20158,930,172'Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration'20158,918,742'Methods and systems for pattern design with tailored response to wavefront aberration'20148,893,058'Methods and system for model-based generic matching and tuning'20148,893,067'System and method for lithography simulation'20148,893,060'Optimization of source, mask and projection optics'20148,874,423'Model-based scanner tuning systems and methods'20148,856,694'Computational process control'20148,838,632'Methods and apparatus for searching with awareness of geography and languages'20148,806,387'Model-based process simulation systems and methods'20148,806,394'Pattern-dependent proximity matching/tuning including light manipulation by projection optics'20148,745,551'Pattern-independent and hybrid matching/tuning including light manipulation by projection optics'20148,732,625'Methods for performing model-based lithography guided layout design'20148,700,493'Methods and apparatus for freshness and completeness of information'20148,694,928'Pattern selection for lithographic model calibration'20148,682,059'Harmonic resist model for use in a lithographic apparatus and a device manufacturing method'20148,589,829'Three-dimensional mask model for photolithography simulation'20138,584,056'Fast freeform source and mask co-optimization method'20138,570,485'Lens heating compensation systems and methods'20138,571,845'Model-based scanner tuning systems and methods'20138,560,978'Pattern-dependent proximity matching/tuning including light manipulation by projection optics'20138,542,340'Illumination optimization'20138,527,255'Methods and systems for lithography process window simulation'20138,516,405'System and method for lithography simulation'20138,447,095'Harmonic resist model for use in a lithographic apparatus and a device manufacturing method'20138,443,307'Methods and system for model-based generic matching and tuning'20138,418,088'Methods and system for lithography calibration'20138,412,536'Methods and apparatus for freshness and completeness of information'20138,379,991'Delta TCC for fast sensitivity model computation'20138,352,885'Three-dimensional mask model for photolithography simulation'20138,245,160'System and method for creating a focus-exposure model of a lithography process'20128,209,640'System and method for lithography simulation'20128,200,468'Methods and system for lithography process window simulation'20128,065,636'System and method for creating a focus-exposure model of a lithography process'20118,056,028'Method of performing mask-writer tuning and optimization'20118,041,611'Pricing and auctioning of bundled items among multiple sellers and buyers'20117,999,920'Method of performing model-based scanner tuning'20117,974,972'Methods and apparatus for searching with awareness of geography and languages'20117,882,480'System and method for model-based sub-resolution assist feature generation'20117,873,937'System and method for lithography simulation'20117,840,447'Pricing and auctioning of bundled items among multiple sellers and buyers'20107,809,610'Methods and apparatus for freshness and completeness of information'20107,749,666'System and method for measuring and analyzing lithographic parameters and determining optimal process corrections'20107,747,978'System and method for creating a focus-exposure model of a lithography process'20107,703,069'Three-dimensional mask model for photolithography simulation'20107,571,106'Methods and apparatus for freshness and completeness of information'20097,558,419'System and method for detecting integrated circuit pattern defects'20097,523,108'Methods and apparatus for searching with awareness of geography and languages'20097,499,156'Closed region defect detection system'20097,488,933'Method for lithography model calibration'20097,483,894'Methods and apparatus for entity search'20097,126,681'Closed region defect detection system'20067,120,895'System and method for lithography simulation'20067,117,477'System and method for lithography simulation'20067,117,478'System and method for lithography simulation'20067,114,145'System and method for lithography simulation'20067,111,277'System and method for lithography simulation'20067,003,758'System and method for lithography simulation'20066,782,199'Optical communications systems with optical subsystem communications links'20046,654,489'Apparatus and methods for collecting global data during a reticle inspection'20036,567,960'System for improving circuit simulations by utilizing a simplified circuit model based on effective capacitance and inductance values'20036,516,085'Apparatus and methods for collecting global data during a reticle inspection'20036,476,961'Optical amplifier systems with transient control'20026,414,788'Optical amplifier system with transient control'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2019Based in Cupertino, CA, US· patent location history
2009–2014Based in Monterey Park, CA, US· patent location history
2010–2020Patents assigned to ASML NETHERLANDS BV (67)· patent assignee history
2010–2020Patents assigned to CAO YU (45)· patent assignee history
2011–2017Patents assigned to YE JUN (29)· patent assignee history
2012–2020Based in Saratoga, CA, US· patent location history
2015–2020Patents assigned to EMC CORP (29)· patent assignee history
2015–2020Based in Beijing, CN· patent location history
2015–2020Based in Kanata, CA· patent location history
2017–2020Patents assigned to EMC IP HOLDING CO LLC (42)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV672010–2020
CAO YUself452010–2020
EMC IP HOLDING CO LLC422017–2020
EMC CORP292015–2020
YE JUN292011–2017
Locations
LocationPatentsSpan
Beijing, CN462015–2020
Saratoga, California, US432012–2020
Cupertino, California, US382002–2019
Kanata, CA192015–2020
Monterey Park, California, US102009–2014