LexDanaLexDanabeta
Inventor

Ming-Yeon Hung

Inventor
Hsinchu, TW

Overview

3→
Patents
1998–2012
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1043%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
G05BControl or regulating systems in general14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
PatentTitleYear
8,229,588'Method and system for tuning advanced process control parameters'20126,069,091'In-situ sequential silicon containing hard mask layer/silicon layer plasma etch method'20005,770,523'Method for removal of photoresist residue after dry metal etch'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2012Patents assigned to TAIWAN SEMICONDUCTOR MFG (3)· patent assignee history
1998–2012Based in Hsinchu, TW· patent location history
2012Patents assigned to FAN MING-YU (1)· patent assignee history
2012Patents assigned to FEI WANG JO (1)· patent assignee history
2012Patents assigned to HSU CHIH-WEI (1)· patent assignee history
2012Patents assigned to HUNG MING-YEON (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG31998–2012
FAN MING-YU12012
FEI WANG JO12012
HSU CHIH-WEI12012
HUNG MING-YEONself12012
Locations
LocationPatentsSpan
Hsinchu, TW31998–2012